JPS5530212B2 - - Google Patents
Info
- Publication number
- JPS5530212B2 JPS5530212B2 JP10219575A JP10219575A JPS5530212B2 JP S5530212 B2 JPS5530212 B2 JP S5530212B2 JP 10219575 A JP10219575 A JP 10219575A JP 10219575 A JP10219575 A JP 10219575A JP S5530212 B2 JPS5530212 B2 JP S5530212B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50102195A JPS5226214A (en) | 1975-08-25 | 1975-08-25 | Method for coating resist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50102195A JPS5226214A (en) | 1975-08-25 | 1975-08-25 | Method for coating resist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5226214A JPS5226214A (en) | 1977-02-26 |
| JPS5530212B2 true JPS5530212B2 (cg-RX-API-DMAC10.html) | 1980-08-09 |
Family
ID=14320871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50102195A Granted JPS5226214A (en) | 1975-08-25 | 1975-08-25 | Method for coating resist |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5226214A (cg-RX-API-DMAC10.html) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0246366B2 (cg-RX-API-DMAC10.html) * | 1980-08-11 | 1990-10-15 | Discovision Ass | |
| JPS5916333A (ja) * | 1982-07-19 | 1984-01-27 | Matsushita Electronics Corp | レジストの塗布方法 |
| JPS60123031A (ja) * | 1983-12-08 | 1985-07-01 | Hoya Corp | レジスト塗布方法 |
| JPS6197923A (ja) * | 1984-10-19 | 1986-05-16 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
| JP2015223556A (ja) * | 2014-05-28 | 2015-12-14 | 株式会社ディスコ | 保護被膜の被覆方法 |
| NL2014864B1 (en) * | 2015-05-27 | 2017-01-31 | Suss Microtec Lithography Gmbh | Device for treating a disc-shaped substrate and support adapter. |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS493029A (cg-RX-API-DMAC10.html) * | 1972-04-27 | 1974-01-11 |
-
1975
- 1975-08-25 JP JP50102195A patent/JPS5226214A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5226214A (en) | 1977-02-26 |