JPS5524259B2 - - Google Patents
Info
- Publication number
- JPS5524259B2 JPS5524259B2 JP10854676A JP10854676A JPS5524259B2 JP S5524259 B2 JPS5524259 B2 JP S5524259B2 JP 10854676 A JP10854676 A JP 10854676A JP 10854676 A JP10854676 A JP 10854676A JP S5524259 B2 JPS5524259 B2 JP S5524259B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Led Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10854676A JPS5334464A (en) | 1976-09-10 | 1976-09-10 | Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10854676A JPS5334464A (en) | 1976-09-10 | 1976-09-10 | Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5334464A JPS5334464A (en) | 1978-03-31 |
| JPS5524259B2 true JPS5524259B2 (pt) | 1980-06-27 |
Family
ID=14487558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10854676A Granted JPS5334464A (en) | 1976-09-10 | 1976-09-10 | Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5334464A (pt) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6231023U (pt) * | 1985-08-08 | 1987-02-24 | ||
| KR20220093932A (ko) | 2020-12-28 | 2022-07-05 | 주식회사 엘지에너지솔루션 | 연속 공정으로 이루어진 전지제조 공정의 수량 감지 이상을 교정하는 전지제조 장치 및 이를 이용하여 수량 감지 이상을 교정하는 방법 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3245867A1 (de) * | 1982-12-11 | 1984-06-14 | EUROSIL electronic GmbH, 8057 Eching | Spannungsarme, thermisch unempfindliche traegerschicht fuer eine absorberstruktur einer bestrahlungsmaske fuer roentgenlithographie |
| JPS60220933A (ja) * | 1984-04-18 | 1985-11-05 | Nec Corp | Ｘ線露光マスク及びその製造方法 |
-
1976
- 1976-09-10 JP JP10854676A patent/JPS5334464A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6231023U (pt) * | 1985-08-08 | 1987-02-24 | ||
| KR20220093932A (ko) | 2020-12-28 | 2022-07-05 | 주식회사 엘지에너지솔루션 | 연속 공정으로 이루어진 전지제조 공정의 수량 감지 이상을 교정하는 전지제조 장치 및 이를 이용하여 수량 감지 이상을 교정하는 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5334464A (en) | 1978-03-31 |