JPS5334464A - Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor - Google Patents
Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductorInfo
- Publication number
- JPS5334464A JPS5334464A JP10854676A JP10854676A JPS5334464A JP S5334464 A JPS5334464 A JP S5334464A JP 10854676 A JP10854676 A JP 10854676A JP 10854676 A JP10854676 A JP 10854676A JP S5334464 A JPS5334464 A JP S5334464A
- Authority
- JP
- Japan
- Prior art keywords
- liquiddgrowth
- furnace
- semiconductor
- vapour pressure
- controlling vapour
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10854676A JPS5334464A (en) | 1976-09-10 | 1976-09-10 | Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10854676A JPS5334464A (en) | 1976-09-10 | 1976-09-10 | Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5334464A true JPS5334464A (en) | 1978-03-31 |
JPS5524259B2 JPS5524259B2 (en) | 1980-06-27 |
Family
ID=14487558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10854676A Granted JPS5334464A (en) | 1976-09-10 | 1976-09-10 | Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5334464A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59116750A (en) * | 1982-12-11 | 1984-07-05 | ユ−ロジル・エレクトロニツク・ゲ−エムベ−ハ− | Radiation mask base layer for x ray lithography and manufacture thereof |
JPS60220933A (en) * | 1984-04-18 | 1985-11-05 | Nec Corp | X-ray exposing mask and manufacture thereof |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6231023U (en) * | 1985-08-08 | 1987-02-24 | ||
KR20220093932A (en) | 2020-12-28 | 2022-07-05 | 주식회사 엘지에너지솔루션 | A battery manufacturing system for correcting abnormalities in the detection of quantity in the continuous battery manufacturing process and method of correcting abnormalities in the detection of quantity thereby |
-
1976
- 1976-09-10 JP JP10854676A patent/JPS5334464A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59116750A (en) * | 1982-12-11 | 1984-07-05 | ユ−ロジル・エレクトロニツク・ゲ−エムベ−ハ− | Radiation mask base layer for x ray lithography and manufacture thereof |
JPS60220933A (en) * | 1984-04-18 | 1985-11-05 | Nec Corp | X-ray exposing mask and manufacture thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS5524259B2 (en) | 1980-06-27 |
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