JPS5521106B2 - - Google Patents
Info
- Publication number
- JPS5521106B2 JPS5521106B2 JP12493975A JP12493975A JPS5521106B2 JP S5521106 B2 JPS5521106 B2 JP S5521106B2 JP 12493975 A JP12493975 A JP 12493975A JP 12493975 A JP12493975 A JP 12493975A JP S5521106 B2 JPS5521106 B2 JP S5521106B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12493975A JPS5249990A (en) | 1975-10-17 | 1975-10-17 | Method for vacuum evaporation of multi layr film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12493975A JPS5249990A (en) | 1975-10-17 | 1975-10-17 | Method for vacuum evaporation of multi layr film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5249990A JPS5249990A (en) | 1977-04-21 |
JPS5521106B2 true JPS5521106B2 (fr) | 1980-06-07 |
Family
ID=14897914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12493975A Granted JPS5249990A (en) | 1975-10-17 | 1975-10-17 | Method for vacuum evaporation of multi layr film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5249990A (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57204185U (fr) * | 1981-06-19 | 1982-12-25 | ||
WO2002061169A1 (fr) * | 2001-02-01 | 2002-08-08 | Nikon Corporation | Procede et dispositif pour former un film et procede de fabrication d'un element optique |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104647820A (zh) * | 2015-03-16 | 2015-05-27 | 广东迪奥应用材料科技有限公司 | 一种具有ar和af功能的高硬度高介电常数的盖板 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS495834A (fr) * | 1972-04-15 | 1974-01-19 |
-
1975
- 1975-10-17 JP JP12493975A patent/JPS5249990A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS495834A (fr) * | 1972-04-15 | 1974-01-19 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57204185U (fr) * | 1981-06-19 | 1982-12-25 | ||
WO2002061169A1 (fr) * | 2001-02-01 | 2002-08-08 | Nikon Corporation | Procede et dispositif pour former un film et procede de fabrication d'un element optique |
Also Published As
Publication number | Publication date |
---|---|
JPS5249990A (en) | 1977-04-21 |