JPS5517333A - Vaporization of low-boiling residue discharged from production process of vinyl chloride monomer - Google Patents
Vaporization of low-boiling residue discharged from production process of vinyl chloride monomerInfo
- Publication number
- JPS5517333A JPS5517333A JP8994378A JP8994378A JPS5517333A JP S5517333 A JPS5517333 A JP S5517333A JP 8994378 A JP8994378 A JP 8994378A JP 8994378 A JP8994378 A JP 8994378A JP S5517333 A JPS5517333 A JP S5517333A
- Authority
- JP
- Japan
- Prior art keywords
- low
- residue
- evaporator
- production process
- vinyl chloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
PURPOSE: To vaporize low-boiling residue discharged from the vinyl chloride production process, economically, in an industrial scale, without using a complicated and expensive fluidized bed evaporator, by keeping the residue to liquid phase in an evaporator, and carryiing out the vaporization in the presence of chlorine at a specific temperature.
CONSTITUTION: Low-boiling residue discharged from the vinyl chloride production process, is vaporized in an evaporator pref. made of glass, porcelain, graphite, nickel or Inconel, or lined with glass or a fluoro-resin, under liquid phase, at 20W 200°C, pref. 60W180°C above atmospheric pressure, while introducing (pref. ≥ 0.001 wt% based on the residue) chlorine directly and continuously, or as a solution in the low-boiling residue.
EFFECT: The residue can be evaporated without using a decomposition inhibitor and producing tarry by-products. The liquid left after the evaporation is colorless, and the heating surface of the evaporator is kept clean.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53089943A JPS5914010B2 (en) | 1978-07-25 | 1978-07-25 | Method for vaporizing low boiling point residue |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53089943A JPS5914010B2 (en) | 1978-07-25 | 1978-07-25 | Method for vaporizing low boiling point residue |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5517333A true JPS5517333A (en) | 1980-02-06 |
JPS5914010B2 JPS5914010B2 (en) | 1984-04-02 |
Family
ID=13984776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53089943A Expired JPS5914010B2 (en) | 1978-07-25 | 1978-07-25 | Method for vaporizing low boiling point residue |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5914010B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3876714A (en) * | 1970-02-20 | 1975-04-08 | Solvay | Chloroprene removal from pyrolyzed 1,2-dichlorethane |
-
1978
- 1978-07-25 JP JP53089943A patent/JPS5914010B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3876714A (en) * | 1970-02-20 | 1975-04-08 | Solvay | Chloroprene removal from pyrolyzed 1,2-dichlorethane |
Also Published As
Publication number | Publication date |
---|---|
JPS5914010B2 (en) | 1984-04-02 |
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