JPS55161584A - Electron beam working machine - Google Patents

Electron beam working machine

Info

Publication number
JPS55161584A
JPS55161584A JP7003879A JP7003879A JPS55161584A JP S55161584 A JPS55161584 A JP S55161584A JP 7003879 A JP7003879 A JP 7003879A JP 7003879 A JP7003879 A JP 7003879A JP S55161584 A JPS55161584 A JP S55161584A
Authority
JP
Japan
Prior art keywords
focusing coil
electron gun
vacuum chamber
work
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7003879A
Other languages
Japanese (ja)
Inventor
Hisanao Kita
Yoshinori Karatsu
Takamitsu Nakasaki
Youji Akutsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7003879A priority Critical patent/JPS55161584A/en
Priority to US06/131,857 priority patent/US4327273A/en
Priority to EP80300891A priority patent/EP0017405B1/en
Priority to DE8080300891T priority patent/DE3070093D1/en
Publication of JPS55161584A publication Critical patent/JPS55161584A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To prevent the electric discharge accident within an electron gun by disposing two beam adjusters and maintaining the distance between the work placed in a vacuum chamber and the 1st focusing coil at above the mean free path of molecules under working vacuum.
CONSTITUTION: The 2nd beam adjuster 20 consisting of the 2nd focusing coil 18 and 2nd deflecting coil 19 is fixed to the wall surface 2 of a vacuum chamber 1, and the 1st beam adjuster 8 consisting of the 1st focusing coil 6 and the 1st deflecting coil 7 is fixed by way of a supporting column 23 to its extension line. If at this time the distance L2 between the 1st focusing coil and the work 10 placed in the vacuum chamber is held at above the mean free path of the molecules corresponding to the degree of vacuum in the support column, the likelihood of the entry of the molecules of the gas, metal vapor, etc. evolved from the work radiated by electron beams 11 into an electron gun 9 is eliminated. Hence, the electric discharge accident in the electron gun is prevented and the stable beam working is accomplished.
COPYRIGHT: (C)1980,JPO&Japio
JP7003879A 1979-03-23 1979-06-06 Electron beam working machine Pending JPS55161584A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP7003879A JPS55161584A (en) 1979-06-06 1979-06-06 Electron beam working machine
US06/131,857 US4327273A (en) 1979-03-23 1980-03-19 Method of treating a workpiece with electron beams and apparatus therefor
EP80300891A EP0017405B1 (en) 1979-03-23 1980-03-21 Method of treating a workpiece with an electron beam
DE8080300891T DE3070093D1 (en) 1979-03-23 1980-03-21 Method of treating a workpiece with an electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7003879A JPS55161584A (en) 1979-06-06 1979-06-06 Electron beam working machine

Publications (1)

Publication Number Publication Date
JPS55161584A true JPS55161584A (en) 1980-12-16

Family

ID=13420008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7003879A Pending JPS55161584A (en) 1979-03-23 1979-06-06 Electron beam working machine

Country Status (1)

Country Link
JP (1) JPS55161584A (en)

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