JPS55159428A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS55159428A
JPS55159428A JP6761579A JP6761579A JPS55159428A JP S55159428 A JPS55159428 A JP S55159428A JP 6761579 A JP6761579 A JP 6761579A JP 6761579 A JP6761579 A JP 6761579A JP S55159428 A JPS55159428 A JP S55159428A
Authority
JP
Japan
Prior art keywords
heat
rays
mirror
photomask
accuracy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6761579A
Other languages
Japanese (ja)
Inventor
Nobuki Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6761579A priority Critical patent/JPS55159428A/en
Publication of JPS55159428A publication Critical patent/JPS55159428A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To improve the accuracy of pattern position alignment by removing the heat rays contained in radiation light and the heat occuring in said heat rays. CONSTITUTION:A heat pipe 8a is disposed in close contact with the back of a cold mirror 5 and the heat by heat rays such as infrared rays and far infrared rays is absorbed and removed by refrigerant such as water. Since this enables the removal of the heat of the luminous flux from a light source 1 such as high-voltage mercury arc lamp past condensing mirror 2, reflecting mirror 3 and field lens 4, reflected by the cold mirror 5 and transmitting through a photomask 7 by a radiation lens 6, the temperature rise of the photomask 7 and substrate at the exposure operation is eliminated and the accuracy of pattern position alignment is improved.
JP6761579A 1979-05-31 1979-05-31 Exposure device Pending JPS55159428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6761579A JPS55159428A (en) 1979-05-31 1979-05-31 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6761579A JPS55159428A (en) 1979-05-31 1979-05-31 Exposure device

Publications (1)

Publication Number Publication Date
JPS55159428A true JPS55159428A (en) 1980-12-11

Family

ID=13350033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6761579A Pending JPS55159428A (en) 1979-05-31 1979-05-31 Exposure device

Country Status (1)

Country Link
JP (1) JPS55159428A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61185333A (en) * 1985-02-12 1986-08-19 Ulvac Corp Optically promoted surface chemical reaction apparatus
JPH01117025A (en) * 1987-10-30 1989-05-09 Ushio Inc Light illuminating equipment
JPH01117324A (en) * 1987-10-30 1989-05-10 Ushio Inc Light irradiating device
JPH04116559A (en) * 1990-09-06 1992-04-17 Orc Mfg Co Ltd Exposing device and heat absorption type cold mirror
KR100823181B1 (en) 2007-03-19 2008-04-21 오에프티 주식회사 Exposure device with cooling apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51146781A (en) * 1975-06-10 1976-12-16 Matsushita Electric Works Ltd Lighting fixture
JPS523282A (en) * 1975-06-24 1977-01-11 Matsushita Electric Works Ltd Lighting device
JPS523283A (en) * 1975-06-24 1977-01-11 Matsushita Electric Works Ltd Lighting device
JPS5595937A (en) * 1979-01-16 1980-07-21 Canon Inc Original lighting device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51146781A (en) * 1975-06-10 1976-12-16 Matsushita Electric Works Ltd Lighting fixture
JPS523282A (en) * 1975-06-24 1977-01-11 Matsushita Electric Works Ltd Lighting device
JPS523283A (en) * 1975-06-24 1977-01-11 Matsushita Electric Works Ltd Lighting device
JPS5595937A (en) * 1979-01-16 1980-07-21 Canon Inc Original lighting device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61185333A (en) * 1985-02-12 1986-08-19 Ulvac Corp Optically promoted surface chemical reaction apparatus
JPH01117025A (en) * 1987-10-30 1989-05-09 Ushio Inc Light illuminating equipment
JPH01117324A (en) * 1987-10-30 1989-05-10 Ushio Inc Light irradiating device
JPH04116559A (en) * 1990-09-06 1992-04-17 Orc Mfg Co Ltd Exposing device and heat absorption type cold mirror
KR100823181B1 (en) 2007-03-19 2008-04-21 오에프티 주식회사 Exposure device with cooling apparatus

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