JPS551593A - Xxray spectrometer - Google Patents

Xxray spectrometer

Info

Publication number
JPS551593A
JPS551593A JP7344779A JP7344779A JPS551593A JP S551593 A JPS551593 A JP S551593A JP 7344779 A JP7344779 A JP 7344779A JP 7344779 A JP7344779 A JP 7344779A JP S551593 A JPS551593 A JP S551593A
Authority
JP
Japan
Prior art keywords
xxray
spectrometer
xxray spectrometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7344779A
Other languages
English (en)
Other versions
JPS6249929B2 (ja
Inventor
Biruherumu Berunaa Be Herumuto
Furanshisukasu Ku Biruherumusu
Biruherumusu Bitomer Antoniusu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of JPS551593A publication Critical patent/JPS551593A/ja
Publication of JPS6249929B2 publication Critical patent/JPS6249929B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H01J35/153—Spot position control
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/072—Investigating materials by wave or particle radiation secondary emission combination of measurements, 2 kinds of secondary emission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/10—Different kinds of radiation or particles
    • G01N2223/1006—Different kinds of radiation or particles different radiations, e.g. X and alpha
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/10—Different kinds of radiation or particles
    • G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016—X-ray
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/20—Sources of radiation
    • G01N2223/204—Sources of radiation source created from radiated target
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/308—Accessories, mechanical or electrical features support of radiation source
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/309—Accessories, mechanical or electrical features support of sample holder
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/313—Accessories, mechanical or electrical features filters, rotating filter disc
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/33—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts
    • G01N2223/3306—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts object rotates

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP7344779A 1978-06-12 1979-06-11 Xxray spectrometer Granted JPS551593A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7806330A NL7806330A (nl) 1978-06-12 1978-06-12 Roentgenspektrometer.

Publications (2)

Publication Number Publication Date
JPS551593A true JPS551593A (en) 1980-01-08
JPS6249929B2 JPS6249929B2 (ja) 1987-10-22

Family

ID=19831018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7344779A Granted JPS551593A (en) 1978-06-12 1979-06-11 Xxray spectrometer

Country Status (6)

Country Link
US (1) US4280049A (ja)
JP (1) JPS551593A (ja)
DE (1) DE2923190A1 (ja)
FR (1) FR2428836A1 (ja)
GB (1) GB2022916B (ja)
NL (1) NL7806330A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5717438U (ja) * 1980-06-27 1982-01-29
JPS60100038A (ja) * 1983-11-04 1985-06-03 Shimadzu Corp Ｘ線マイクロアナライザによる表層分析方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2506019A1 (fr) * 1981-05-14 1982-11-19 Commissariat Energie Atomique Dispositif pour determiner la densite des etats electroniques inoccupes d'un materiau situes au-dessus du niveau de fermi
DE3206861A1 (de) * 1982-02-26 1983-05-26 Richard Dipl.-Phys. 7000 Stuttgart Eckert Roentgenfluoreszenz-zusatz fuer elektronenstrahlgeraete
US4493097A (en) * 1982-08-30 1985-01-08 The Perkin-Elmer Corporation Electron gun assembly
US4837794A (en) * 1984-10-12 1989-06-06 Maxwell Laboratories Inc. Filter apparatus for use with an x-ray source
US5903004A (en) * 1994-11-25 1999-05-11 Hitachi, Ltd. Energy dispersive X-ray analyzer
UA59495C2 (uk) 2000-08-07 2003-09-15 Мурадін Абубєкіровіч Кумахов Рентгенівський вимірювально-випробувальний комплекс
CN106768874A (zh) * 2016-11-18 2017-05-31 中国科学院西安光学精密机械研究所 一种x射线聚焦光学聚焦性能测量装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1426598A (fr) * 1964-04-01 1966-01-28 Centre Nat Rech Metall Spectromètre universel à rayonnement électromagnétique à haute sensibilité de détection
FR1447337A (fr) * 1965-06-15 1966-07-29 Radiologie Cie Gle Perfectionnements aux dispositifs d'analyse par spectrométrie aux rayons chi
GB1159905A (en) * 1967-03-20 1969-07-30 Applied Res Lab Inc X-Ray Generating Apparatus.
FR1578532A (ja) * 1967-08-30 1969-08-14

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5717438U (ja) * 1980-06-27 1982-01-29
JPH0134113Y2 (ja) * 1980-06-27 1989-10-17
JPS60100038A (ja) * 1983-11-04 1985-06-03 Shimadzu Corp Ｘ線マイクロアナライザによる表層分析方法

Also Published As

Publication number Publication date
DE2923190C2 (ja) 1987-09-17
NL7806330A (nl) 1979-12-14
GB2022916B (en) 1982-06-23
FR2428836B1 (ja) 1985-04-19
US4280049A (en) 1981-07-21
GB2022916A (en) 1979-12-19
FR2428836A1 (fr) 1980-01-11
JPS6249929B2 (ja) 1987-10-22
DE2923190A1 (de) 1979-12-13

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