JPS55154733A - Method of correcting defective mask - Google Patents

Method of correcting defective mask

Info

Publication number
JPS55154733A
JPS55154733A JP6156779A JP6156779A JPS55154733A JP S55154733 A JPS55154733 A JP S55154733A JP 6156779 A JP6156779 A JP 6156779A JP 6156779 A JP6156779 A JP 6156779A JP S55154733 A JPS55154733 A JP S55154733A
Authority
JP
Japan
Prior art keywords
mask
light
defective mask
refracted
pinhole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6156779A
Other languages
Japanese (ja)
Other versions
JPS5751255B2 (en
Inventor
Hiroshi Otsuka
Masanori Sato
Akira Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP6156779A priority Critical patent/JPS55154733A/en
Publication of JPS55154733A publication Critical patent/JPS55154733A/en
Publication of JPS5751255B2 publication Critical patent/JPS5751255B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Abstract

PURPOSE:To correct a defective mask, by working the surface of a transparent base plate in a white pinhole so that incident light is refracted or diffusedly reflected by the worked surface. CONSTITUTION:The surface of a glass plate 12 in a white pinhole 14 is machined by a diamond stylus or the like so that the surface is changed into a mat surface 18. Incident light is converted into diffusedly reflected light 19 and refracted light 20 by the surface to prevent the white pinhole from being copied. The mat surface can be also manufactured by etching. According to this method, accurate work is performed. Said method can be applied to a mask of fine pattern.
JP6156779A 1979-05-21 1979-05-21 Method of correcting defective mask Granted JPS55154733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6156779A JPS55154733A (en) 1979-05-21 1979-05-21 Method of correcting defective mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6156779A JPS55154733A (en) 1979-05-21 1979-05-21 Method of correcting defective mask

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP57004898A Division JPS57136326A (en) 1982-01-18 1982-01-18 Correcting method for defective mask

Publications (2)

Publication Number Publication Date
JPS55154733A true JPS55154733A (en) 1980-12-02
JPS5751255B2 JPS5751255B2 (en) 1982-11-01

Family

ID=13174819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6156779A Granted JPS55154733A (en) 1979-05-21 1979-05-21 Method of correcting defective mask

Country Status (1)

Country Link
JP (1) JPS55154733A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS605524A (en) * 1983-05-31 1985-01-12 アメリカン・テレフオン・アンド・テレグラフ・カムパニ− Solid device producing method and lithographic mask
WO2005124455A1 (en) * 2004-06-22 2005-12-29 Hoya Corporation Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150225A (en) * 1979-05-11 1980-11-22 Hitachi Ltd Method of correcting white spot fault of photomask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150225A (en) * 1979-05-11 1980-11-22 Hitachi Ltd Method of correcting white spot fault of photomask

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS605524A (en) * 1983-05-31 1985-01-12 アメリカン・テレフオン・アンド・テレグラフ・カムパニ− Solid device producing method and lithographic mask
WO2005124455A1 (en) * 2004-06-22 2005-12-29 Hoya Corporation Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask
US7862960B2 (en) 2004-06-22 2011-01-04 Hoya Corporation Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks
US8039178B2 (en) 2004-06-22 2011-10-18 Hoya Corporation Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks

Also Published As

Publication number Publication date
JPS5751255B2 (en) 1982-11-01

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