JPS55152164A - Thermal treatment for thin plate of amorphous magnetic alloy - Google Patents
Thermal treatment for thin plate of amorphous magnetic alloyInfo
- Publication number
- JPS55152164A JPS55152164A JP6035979A JP6035979A JPS55152164A JP S55152164 A JPS55152164 A JP S55152164A JP 6035979 A JP6035979 A JP 6035979A JP 6035979 A JP6035979 A JP 6035979A JP S55152164 A JPS55152164 A JP S55152164A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- wound
- magnetic field
- winding
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Soft Magnetic Materials (AREA)
Abstract
PURPOSE: To mass produce the thin plates having good magnetic properties by a method wherein the thin plate of a amorphous magnetic alloy is wound in cylindrical form, is wound with winding, maintained under external magnetic field and heated below Curie point and below its crystallization temperature, and generated external magnetic field is rotated.
CONSTITUTION: The thin plate 1 of amorphous magnetic alloy is formed into a wound magnetic core, or alternatively it is wound in its longitudinal direction on a winding roller immediately after it is rapidly cooled. Then, the plate 1 is wound with winding 3, which is connected via a phase controller P to AC supply E. The electric furnace 4 is then energized to heat the plate 1 to a specified temperature, the power E is supplied to cause current i1 to flow electromagnets 21, 23 so that external magnetic field H1 is applied to the plate 1 in its width direction. Meanwhile, current i2 is applied to the winding 3 to generate magnetic field H2 in the longitudinal direction of the plate 1. The resultant H1 and H2 magnetic field is rotated at definite direction at a definite cycle. After a specified time, current is turned off and the plate is cooled. As a result, magnetic anisotropy induced in the plate 1 is made isotropic, thereby effecting desired results.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6035979A JPS55152164A (en) | 1979-05-18 | 1979-05-18 | Thermal treatment for thin plate of amorphous magnetic alloy |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6035979A JPS55152164A (en) | 1979-05-18 | 1979-05-18 | Thermal treatment for thin plate of amorphous magnetic alloy |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55152164A true JPS55152164A (en) | 1980-11-27 |
Family
ID=13139866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6035979A Pending JPS55152164A (en) | 1979-05-18 | 1979-05-18 | Thermal treatment for thin plate of amorphous magnetic alloy |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55152164A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007529250A (en) * | 2004-03-19 | 2007-10-25 | スプログ リミテッド | mattress |
-
1979
- 1979-05-18 JP JP6035979A patent/JPS55152164A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007529250A (en) * | 2004-03-19 | 2007-10-25 | スプログ リミテッド | mattress |
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