JPS55149114A - Preparation of silicon - Google Patents

Preparation of silicon

Info

Publication number
JPS55149114A
JPS55149114A JP5935080A JP5935080A JPS55149114A JP S55149114 A JPS55149114 A JP S55149114A JP 5935080 A JP5935080 A JP 5935080A JP 5935080 A JP5935080 A JP 5935080A JP S55149114 A JPS55149114 A JP S55149114A
Authority
JP
Japan
Prior art keywords
silicon
preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5935080A
Other languages
English (en)
Japanese (ja)
Inventor
Deiitsue Uorufugangu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of JPS55149114A publication Critical patent/JPS55149114A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP5935080A 1979-05-04 1980-05-02 Preparation of silicon Pending JPS55149114A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792918060 DE2918060A1 (de) 1979-05-04 1979-05-04 Verfahren zur rueckgewinnung von bei der abscheidung von silicium durch thermische zersetzung anfallenden restgasen

Publications (1)

Publication Number Publication Date
JPS55149114A true JPS55149114A (en) 1980-11-20

Family

ID=6069964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5935080A Pending JPS55149114A (en) 1979-05-04 1980-05-02 Preparation of silicon

Country Status (2)

Country Link
JP (1) JPS55149114A (enrdf_load_stackoverflow)
DE (1) DE2918060A1 (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58221269A (ja) * 1982-06-17 1983-12-22 Toshiba Corp Ｓｉ系感光体の製造装置
JPH02124799A (ja) * 1988-11-01 1990-05-14 Fujitsu Ltd ダイヤモンド膜合成方法
CN105473210A (zh) * 2013-08-28 2016-04-06 韩化石油化学株式会社 废气净化方法及用于该方法的装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3139705C2 (de) * 1981-10-06 1983-11-10 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Aufarbeitung der bei der Siliciumabscheidung und der Siliciumtetrachlorid-Konvertierung anfallenden Restgase
DE3203743A1 (de) * 1982-02-04 1983-08-04 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur aufbereitung von bei der siliciumherstellung anfallenden abgasen
FR2523113A1 (fr) * 1982-03-10 1983-09-16 G Pi Procede de regeneration des chlorosilanes et de l'hydrogene non entres en reaction lors de l'obtention de silicium semi-conducteur polycristallin; chlorosilanes et hydrogene regeneres par ledit procede
DE102011078676A1 (de) 2011-07-05 2013-01-10 Wacker Chemie Ag Verfahren zur Produktion von Polysilicium

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013735A (enrdf_load_stackoverflow) * 1973-06-06 1975-02-13

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1129937B (de) * 1959-09-28 1962-05-24 Siemens Ag Verfahren und Anordnung zur Rueckgewinnung der unverbrauchten Ausgangsstoffe bei derHerstellung von Reinstsilicium mittels Reduktion von Silanen durch Wasserstoff

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013735A (enrdf_load_stackoverflow) * 1973-06-06 1975-02-13

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58221269A (ja) * 1982-06-17 1983-12-22 Toshiba Corp Ｓｉ系感光体の製造装置
JPH02124799A (ja) * 1988-11-01 1990-05-14 Fujitsu Ltd ダイヤモンド膜合成方法
CN105473210A (zh) * 2013-08-28 2016-04-06 韩化石油化学株式会社 废气净化方法及用于该方法的装置

Also Published As

Publication number Publication date
DE2918060C2 (enrdf_load_stackoverflow) 1987-08-13
DE2918060A1 (de) 1980-11-13

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