JPS55149114A - Preparation of silicon - Google Patents

Preparation of silicon

Info

Publication number
JPS55149114A
JPS55149114A JP5935080A JP5935080A JPS55149114A JP S55149114 A JPS55149114 A JP S55149114A JP 5935080 A JP5935080 A JP 5935080A JP 5935080 A JP5935080 A JP 5935080A JP S55149114 A JPS55149114 A JP S55149114A
Authority
JP
Japan
Prior art keywords
silicon
preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5935080A
Other languages
Japanese (ja)
Inventor
Deiitsue Uorufugangu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS55149114A publication Critical patent/JPS55149114A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP5935080A 1979-05-04 1980-05-02 Preparation of silicon Pending JPS55149114A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792918060 DE2918060A1 (en) 1979-05-04 1979-05-04 Residual gas recovery in silicon deposition by thermal decomposition - by condensing chloro-silane cpds. and freezing hydrogen chloride, leaving purified hydrogen

Publications (1)

Publication Number Publication Date
JPS55149114A true JPS55149114A (en) 1980-11-20

Family

ID=6069964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5935080A Pending JPS55149114A (en) 1979-05-04 1980-05-02 Preparation of silicon

Country Status (2)

Country Link
JP (1) JPS55149114A (en)
DE (1) DE2918060A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58221269A (en) * 1982-06-17 1983-12-22 Toshiba Corp Production device for si photoreceptor
JPH02124799A (en) * 1988-11-01 1990-05-14 Fujitsu Ltd Method for synthesizing diamond film
CN105473210A (en) * 2013-08-28 2016-04-06 韩化石油化学株式会社 Method for purification of off-gas and device for the same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3139705C2 (en) * 1981-10-06 1983-11-10 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Process for processing the residual gases produced during silicon deposition and silicon tetrachloride conversion
DE3203743A1 (en) * 1982-02-04 1983-08-04 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen METHOD FOR THE TREATMENT OF EXHAUST GASES CONTAINING SILICON PRODUCTION
FR2523113A1 (en) * 1982-03-10 1983-09-16 G Pi Reclaiming chloro:silane and hydrogen when mfg. silicon - where gas leaving reactor is subjected to multistage fractional condensn. and then multistage cooling
DE102011078676A1 (en) 2011-07-05 2013-01-10 Wacker Chemie Ag Process for the production of polysilicon

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013735A (en) * 1973-06-06 1975-02-13

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1129937B (en) * 1959-09-28 1962-05-24 Siemens Ag Process and arrangement for the recovery of the unconsumed starting materials in the production of hyperpure silicon by means of the reduction of silanes by hydrogen

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5013735A (en) * 1973-06-06 1975-02-13

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58221269A (en) * 1982-06-17 1983-12-22 Toshiba Corp Production device for si photoreceptor
JPH02124799A (en) * 1988-11-01 1990-05-14 Fujitsu Ltd Method for synthesizing diamond film
CN105473210A (en) * 2013-08-28 2016-04-06 韩化石油化学株式会社 Method for purification of off-gas and device for the same

Also Published As

Publication number Publication date
DE2918060A1 (en) 1980-11-13
DE2918060C2 (en) 1987-08-13

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