JPS55145351A - Electrostatic chuck - Google Patents

Electrostatic chuck

Info

Publication number
JPS55145351A
JPS55145351A JP5438780A JP5438780A JPS55145351A JP S55145351 A JPS55145351 A JP S55145351A JP 5438780 A JP5438780 A JP 5438780A JP 5438780 A JP5438780 A JP 5438780A JP S55145351 A JPS55145351 A JP S55145351A
Authority
JP
Japan
Prior art keywords
electrostatic chuck
chuck
electrostatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5438780A
Other languages
Japanese (ja)
Inventor
Baagunaa Uute
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Original Assignee
Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Jena GmbH filed Critical Carl Zeiss Jena GmbH
Publication of JPS55145351A publication Critical patent/JPS55145351A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Jigs For Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Gripping Jigs, Holding Jigs, And Positioning Jigs (AREA)
JP5438780A 1979-04-26 1980-04-25 Electrostatic chuck Pending JPS55145351A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD21251179A DD143131A1 (en) 1979-04-26 1979-04-26 DEVICE FOR ELECTROSTATIC HOLDING OF WORKPIECES, PARTICULARLY SEMICONDUCTED DISCS

Publications (1)

Publication Number Publication Date
JPS55145351A true JPS55145351A (en) 1980-11-12

Family

ID=5517859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5438780A Pending JPS55145351A (en) 1979-04-26 1980-04-25 Electrostatic chuck

Country Status (5)

Country Link
JP (1) JPS55145351A (en)
DD (1) DD143131A1 (en)
DE (1) DE3013352A1 (en)
FR (1) FR2455360A1 (en)
GB (1) GB2050064A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928354A (en) * 1982-08-10 1984-02-15 Toshiba Corp Thin film for electrostatic chuck
JPH08203800A (en) * 1995-01-23 1996-08-09 Toshiba Mach Co Ltd Fixing device of sample holder

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2106325A (en) * 1981-09-14 1983-04-07 Philips Electronic Associated Electrostatic chuck
JPS6059104B2 (en) * 1982-02-03 1985-12-23 株式会社東芝 electrostatic chuck board
US4551192A (en) * 1983-06-30 1985-11-05 International Business Machines Corporation Electrostatic or vacuum pinchuck formed with microcircuit lithography
DE3471827D1 (en) * 1983-09-30 1988-07-07 Philips Electronic Associated Electrostatic chuck and loading method
GB2147459A (en) * 1983-09-30 1985-05-09 Philips Electronic Associated Electrostatic chuck for semiconductor wafers
JPS6099538A (en) * 1983-11-01 1985-06-03 横河・ヒュ−レット・パッカ−ド株式会社 Pin chuck
JPS61161713A (en) * 1985-01-10 1986-07-22 Sumitomo Electric Ind Ltd Parts for manufacture of semiconductor
AT383439B (en) * 1985-11-04 1987-07-10 Akad Wissenschaften Ddr Apparatus for loading devices of dry etching installations
US5325261A (en) * 1991-05-17 1994-06-28 Unisearch Limited Electrostatic chuck with improved release
US5315473A (en) * 1992-01-21 1994-05-24 Applied Materials, Inc. Isolated electrostatic chuck and excitation method
US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
EP0635870A1 (en) * 1993-07-20 1995-01-25 Applied Materials, Inc. An electrostatic chuck having a grooved surface
US5535507A (en) * 1993-12-20 1996-07-16 International Business Machines Corporation Method of making electrostatic chuck with oxide insulator
US5656093A (en) * 1996-03-08 1997-08-12 Applied Materials, Inc. Wafer spacing mask for a substrate support chuck and method of fabricating same
US5745332A (en) * 1996-05-08 1998-04-28 Applied Materials, Inc. Monopolar electrostatic chuck having an electrode in contact with a workpiece

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928354A (en) * 1982-08-10 1984-02-15 Toshiba Corp Thin film for electrostatic chuck
JPH0454972B2 (en) * 1982-08-10 1992-09-01 Tokyo Shibaura Electric Co
JPH08203800A (en) * 1995-01-23 1996-08-09 Toshiba Mach Co Ltd Fixing device of sample holder

Also Published As

Publication number Publication date
FR2455360A1 (en) 1980-11-21
DD143131A1 (en) 1980-07-30
DE3013352A1 (en) 1980-11-13
GB2050064A (en) 1980-12-31

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