JPS55142341A - Transfer mask for x-ray exposure - Google Patents

Transfer mask for x-ray exposure

Info

Publication number
JPS55142341A
JPS55142341A JP5104679A JP5104679A JPS55142341A JP S55142341 A JPS55142341 A JP S55142341A JP 5104679 A JP5104679 A JP 5104679A JP 5104679 A JP5104679 A JP 5104679A JP S55142341 A JPS55142341 A JP S55142341A
Authority
JP
Japan
Prior art keywords
plate body
mask
plastic
mesh
tensile strength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5104679A
Other languages
Japanese (ja)
Other versions
JPS643049B2 (en
Inventor
Yasuo Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5104679A priority Critical patent/JPS55142341A/en
Publication of JPS55142341A publication Critical patent/JPS55142341A/en
Publication of JPS643049B2 publication Critical patent/JPS643049B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To easily fabricate a mask excelling in strength of use and stability in use, by forming a mask by using as a principal material a plate body having a meshlike plate body of specified size being made of low expansion and high tensile strength material enveloped in a plastic material. CONSTITUTION:A plate body of low expansion and high tensile strength material of 1-50mum thickness having through-holes measuring 1-50mm across arrayed, or mesh-like plate material 302 of mesh body or the like in flat plate form being made of low expansion and high tensile strength wire rod measuring 1-5mum in diameter is enveloped with plastic plates 304, 305 to form a plastic plate body 502. This plate body 502 is secured to a support body 501 by stretching the end parts of the plate body 302 and etched or similarly treated to form a pattern 507 for transfer with high X-ray absorption material in the through-holes or mesh region in the plate body 302. Thus is easily obtained a mask excelling in the strength of use and stability in use, with few effects of plastic deformation due to tensile force or thermal expansion, so that coarse alignment with visible light may be also easily achieved.
JP5104679A 1979-04-24 1979-04-24 Transfer mask for x-ray exposure Granted JPS55142341A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5104679A JPS55142341A (en) 1979-04-24 1979-04-24 Transfer mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5104679A JPS55142341A (en) 1979-04-24 1979-04-24 Transfer mask for x-ray exposure

Publications (2)

Publication Number Publication Date
JPS55142341A true JPS55142341A (en) 1980-11-06
JPS643049B2 JPS643049B2 (en) 1989-01-19

Family

ID=12875853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5104679A Granted JPS55142341A (en) 1979-04-24 1979-04-24 Transfer mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS55142341A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211732A (en) * 1981-06-24 1982-12-25 Toshiba Corp X ray exposing mask and manufacture thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211732A (en) * 1981-06-24 1982-12-25 Toshiba Corp X ray exposing mask and manufacture thereof
JPH0243330B2 (en) * 1981-06-24 1990-09-28

Also Published As

Publication number Publication date
JPS643049B2 (en) 1989-01-19

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