JPS55139868A - Production of thick stencil - Google Patents
Production of thick stencilInfo
- Publication number
- JPS55139868A JPS55139868A JP4767879A JP4767879A JPS55139868A JP S55139868 A JPS55139868 A JP S55139868A JP 4767879 A JP4767879 A JP 4767879A JP 4767879 A JP4767879 A JP 4767879A JP S55139868 A JPS55139868 A JP S55139868A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- rays
- spread
- mask
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
PURPOSE: To obtain the thick stencil of a uniform thickness by partially setting the liquid-form photosetting resin layer on a light-transmitting thin layer by the rays through a photo mask then removing the nonsetting resin through composition by the rays similar to those of the screen material spread thereon.
CONSTITUTION: A photo mask 2 is placed on a glass plate or the like 1 which is transparent to horizontal active rays, thence a light-transmitting thin film 3 is spread and is closely contacted therewith. Liquid-form photosetting resin 4 is cast thereon to the specified thickness. Thence, active rays are radiated from light sources 11 through the mask 2 from the thin film 3 side to set the resin of the radiated portions, whereby a latent image is formed. Next, a spread screen material 9 is superposed on the resin layer of the top surface side where the resin has not perfectly set owing to, e.g., hindrance of setting by air or less beam radiation. The oozed out resin is made flat and a cover film 6 is put on. The material 9 and resin are then made composite by such things as placement of a glass plate or the like 7 and radiating beams, etc. again through the mask 2. Next, the resin 4 of the unradiated part is removed.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54047678A JPS6029939B2 (en) | 1979-04-17 | 1979-04-17 | How to make thick stencils |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54047678A JPS6029939B2 (en) | 1979-04-17 | 1979-04-17 | How to make thick stencils |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55139868A true JPS55139868A (en) | 1980-11-01 |
| JPS6029939B2 JPS6029939B2 (en) | 1985-07-13 |
Family
ID=12781928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54047678A Expired JPS6029939B2 (en) | 1979-04-17 | 1979-04-17 | How to make thick stencils |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6029939B2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5367509A (en) * | 1976-11-29 | 1978-06-16 | Hitachi Ltd | Method of producing suspended metal mask |
| JPS5391804A (en) * | 1977-01-24 | 1978-08-12 | Kansai Paint Co Ltd | Method of producing thick film screen printing plate |
| JPS53104306A (en) * | 1977-02-23 | 1978-09-11 | Kansai Paint Co Ltd | Photosensitive resin plate for thick film screen print |
-
1979
- 1979-04-17 JP JP54047678A patent/JPS6029939B2/en not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5367509A (en) * | 1976-11-29 | 1978-06-16 | Hitachi Ltd | Method of producing suspended metal mask |
| JPS5391804A (en) * | 1977-01-24 | 1978-08-12 | Kansai Paint Co Ltd | Method of producing thick film screen printing plate |
| JPS53104306A (en) * | 1977-02-23 | 1978-09-11 | Kansai Paint Co Ltd | Photosensitive resin plate for thick film screen print |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6029939B2 (en) | 1985-07-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5249029A (en) | Silver halide color photographic light sensitive material | |
| ATE31979T1 (en) | VAPOR PERMEABLE RETROREFLECTIVE SHEET MATERIAL. | |
| JPS55139868A (en) | Production of thick stencil | |
| JPS572034A (en) | Mask image forming material and formation of mask image | |
| JPS55106407A (en) | Production of light guide path sheet | |
| JPS5354239A (en) | Method of bonding photosensitive flexographic plate and rubber backingmaterial | |
| JPS5687031A (en) | Photographic printing method and original plate for printing used in execution of this method | |
| JPS57173805A (en) | Optical filter and its manufacture | |
| JPS54110857A (en) | Optical production of sawtooth photo-sensitive resin flim | |
| JPS57189128A (en) | Light shield screen for reflection prevention and its manufacture | |
| JPS5645852A (en) | Manufacture of stained glass | |
| JPS51117054A (en) | Light diffusion plate | |
| JPS55153938A (en) | Image forming material for contact reflection exposure | |
| JPS57122438A (en) | Photomask for projection exposure | |
| JPS5555528A (en) | Mask aligner | |
| JPS5635139A (en) | Fabrication of screen printing plate | |
| JPS5621328A (en) | Method of making pattern | |
| JPS57179850A (en) | Keeping method for photo mask | |
| JPS64545A (en) | Method for exposing color photographic sensitive material, filter and exposure apparatus usable for said method | |
| JPS57112745A (en) | Formation of image | |
| JPS5766967A (en) | Production of original plate for printing | |
| JPS55148112A (en) | Manufacture of matrix by photosensitive resin | |
| JPS5563328A (en) | High frequency heating device | |
| JPS5519791A (en) | Obscure mask for photographying oval grated shadow mask pattern | |
| JPS5511210A (en) | Aperture card |