JPS55136265A - Quinoline derivative having formylstyryl group and its preparation - Google Patents

Quinoline derivative having formylstyryl group and its preparation

Info

Publication number
JPS55136265A
JPS55136265A JP4390579A JP4390579A JPS55136265A JP S55136265 A JPS55136265 A JP S55136265A JP 4390579 A JP4390579 A JP 4390579A JP 4390579 A JP4390579 A JP 4390579A JP S55136265 A JPS55136265 A JP S55136265A
Authority
JP
Japan
Prior art keywords
formula
methylquinoline
compound
photosensitive resins
formylstyryl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4390579A
Other languages
Japanese (ja)
Other versions
JPS5923309B2 (en
Inventor
Kunihiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP4390579A priority Critical patent/JPS5923309B2/en
Publication of JPS55136265A publication Critical patent/JPS55136265A/en
Publication of JPS5923309B2 publication Critical patent/JPS5923309B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Quinoline Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

NEW MATERIAL:Formylstyrylquinoline of formula I and a formylstyrylquinolinium compound of formula II (R is alkyl or aralkyl; X' is anion of strong acid).
EXAMPLE: 2-(P-Formylstyryl)quinoline.
USE: Raw material of water-soluble and highly photosensitive resins. Introduction of styryl-quinolinium groups gives photosensitive resins which are highly sensitive to light of long-wave length. Also useful as low-polluting water-soluble photosensitive resins, for photoresist, photomilling material or carriers supporting bioactive substances, e.g. enzymes.
PROCESS: Methylquinoline (e.g. 2-methylquinoline, 4-methylquinoline) of formula III is made to react with at least an equimolar amount of terephthaldialdehyde to give formylstyrylquinoline of formula I. The compound of formula I is made to react with an alkylation agent of formula R-X (X is strongly acidic residue) to afford a compound of formula II.
COPYRIGHT: (C)1980,JPO&Japio
JP4390579A 1979-04-11 1979-04-11 Quinoline derivatives with formylstyryl group and their production method Expired JPS5923309B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4390579A JPS5923309B2 (en) 1979-04-11 1979-04-11 Quinoline derivatives with formylstyryl group and their production method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4390579A JPS5923309B2 (en) 1979-04-11 1979-04-11 Quinoline derivatives with formylstyryl group and their production method

Publications (2)

Publication Number Publication Date
JPS55136265A true JPS55136265A (en) 1980-10-23
JPS5923309B2 JPS5923309B2 (en) 1984-06-01

Family

ID=12676718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4390579A Expired JPS5923309B2 (en) 1979-04-11 1979-04-11 Quinoline derivatives with formylstyryl group and their production method

Country Status (1)

Country Link
JP (1) JPS5923309B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0181568A2 (en) * 1984-10-30 1986-05-21 Rhone-Poulenc Rorer Pharmaceuticals Inc. Anti-inflammatory/anti-allergic compounds
US5239768A (en) * 1991-01-09 1993-08-31 Daiwa Seiko, Inc. Fishing rod, and its manufacturing method
WO2007132532A1 (en) 2006-05-17 2007-11-22 Murakami Co., Ltd. Photosensitive resin composition and produced therefrom, photosensitive film and stencil for screen printing
JP2008017791A (en) * 2006-07-14 2008-01-31 Shimano Inc Grip structure of fishing rod
US11860539B2 (en) 2020-10-13 2024-01-02 Showa Kako Corporation Polyvinyl acetate based photopolymer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0181568A2 (en) * 1984-10-30 1986-05-21 Rhone-Poulenc Rorer Pharmaceuticals Inc. Anti-inflammatory/anti-allergic compounds
US5239768A (en) * 1991-01-09 1993-08-31 Daiwa Seiko, Inc. Fishing rod, and its manufacturing method
WO2007132532A1 (en) 2006-05-17 2007-11-22 Murakami Co., Ltd. Photosensitive resin composition and produced therefrom, photosensitive film and stencil for screen printing
JP2008017791A (en) * 2006-07-14 2008-01-31 Shimano Inc Grip structure of fishing rod
US11860539B2 (en) 2020-10-13 2024-01-02 Showa Kako Corporation Polyvinyl acetate based photopolymer

Also Published As

Publication number Publication date
JPS5923309B2 (en) 1984-06-01

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