JPS55125275A - Chemical heat treating apparatus of metal processed piece under electric glow charge - Google Patents

Chemical heat treating apparatus of metal processed piece under electric glow charge

Info

Publication number
JPS55125275A
JPS55125275A JP3019380A JP3019380A JPS55125275A JP S55125275 A JPS55125275 A JP S55125275A JP 3019380 A JP3019380 A JP 3019380A JP 3019380 A JP3019380 A JP 3019380A JP S55125275 A JPS55125275 A JP S55125275A
Authority
JP
Japan
Prior art keywords
treating apparatus
heat treating
chemical heat
under electric
piece under
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3019380A
Other languages
Japanese (ja)
Other versions
JPS6253593B2 (en
Inventor
Arekisandorofu Sa Subetosurafu
Sabofu Minchiefu Minchiyo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
VISH MACHINNO ELECTROTECH INST
Original Assignee
VISH MACHINNO ELECTROTECH INST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by VISH MACHINNO ELECTROTECH INST filed Critical VISH MACHINNO ELECTROTECH INST
Publication of JPS55125275A publication Critical patent/JPS55125275A/en
Publication of JPS6253593B2 publication Critical patent/JPS6253593B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/34—Methods of heating
    • C21D1/38—Heating by cathodic discharges
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
    • H02H7/00—Emergency protective circuit arrangements specially adapted for specific types of electric machines or apparatus or for sectionalised protection of cable or line systems, and effecting automatic switching in the event of an undesired change from normal working conditions
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M7/00—Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
    • H02M7/02—Conversion of ac power input into dc power output without possibility of reversal
    • H02M7/04—Conversion of ac power input into dc power output without possibility of reversal by static converters
    • H02M7/12—Conversion of ac power input into dc power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
    • H02M7/125—Avoiding or suppressing excessive transient voltages or currents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • Power Engineering (AREA)
  • Arc Welding Control (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • ing And Chemical Polishing (AREA)
  • Generation Of Surge Voltage And Current (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Control Of Resistance Heating (AREA)
JP3019380A 1979-03-11 1980-03-10 Chemical heat treating apparatus of metal processed piece under electric glow charge Granted JPS55125275A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BG7943198A BG29362A1 (en) 1979-03-11 1979-03-11 Apparatus for chemical- thermal processing of matal articles in the condition of electrical smouldering charge

Publications (2)

Publication Number Publication Date
JPS55125275A true JPS55125275A (en) 1980-09-26
JPS6253593B2 JPS6253593B2 (en) 1987-11-11

Family

ID=3905917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3019380A Granted JPS55125275A (en) 1979-03-11 1980-03-10 Chemical heat treating apparatus of metal processed piece under electric glow charge

Country Status (17)

Country Link
JP (1) JPS55125275A (en)
AT (1) AT365659B (en)
BG (1) BG29362A1 (en)
CH (1) CH644398A5 (en)
CS (1) CS215904B1 (en)
DD (1) DD235802A3 (en)
DE (1) DE3007420C2 (en)
FR (1) FR2451629A1 (en)
GB (1) GB2045553B (en)
GR (1) GR68091B (en)
HU (1) HU190769B (en)
IT (1) IT1145262B (en)
NO (1) NO153320C (en)
PL (1) PL131348B1 (en)
SE (1) SE440169B (en)
SU (1) SU1198132A1 (en)
YU (1) YU41906B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08510504A (en) * 1993-04-02 1996-11-05 アドバンスド エナージィ インダストリーズ，インコーポレイテッド Enhanced reactive DC sputtering system

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BG41745A1 (en) * 1984-12-29 1987-08-14 Minchev Device for discontinuing of arc dicharges in gas dicharge vessel
DE3514690A1 (en) * 1985-04-24 1986-10-30 Aeg-Elotherm Gmbh, 5630 Remscheid DC voltage source for installations for surface treatment of workpieces, especially for an ionitriding curing installation
US5281321A (en) * 1991-08-20 1994-01-25 Leybold Aktiengesellschaft Device for the suppression of arcs
DE4127505C2 (en) * 1991-08-20 2003-05-08 Unaxis Deutschland Holding Device for suppressing arcs in gas discharge devices
CH689767A5 (en) * 1992-03-24 1999-10-15 Balzers Hochvakuum Process for Werkstueckbehandlung in a Vakuumatmosphaere and vacuum treatment system.
WO1994008067A1 (en) * 1992-09-30 1994-04-14 Advanced Energy Industries, Inc. Topographically precise thin film coating system
DE4239218C2 (en) * 1992-11-21 2000-08-10 Leybold Ag Arrangement for preventing flashovers in a plasma process room
DE4242633C2 (en) * 1992-12-17 1996-11-14 Fraunhofer Ges Forschung Process for carrying out stable low-pressure glow processes
US6217717B1 (en) 1992-12-30 2001-04-17 Advanced Energy Industries, Inc. Periodically clearing thin film plasma processing system
US5427669A (en) * 1992-12-30 1995-06-27 Advanced Energy Industries, Inc. Thin film DC plasma processing system
RU2048601C1 (en) * 1993-12-20 1995-11-20 Рыжов Николай Михайлович Method and apparatus to diagnose process of steels and alloys chemical thermal treatment in glow discharge
US5584972A (en) * 1995-02-01 1996-12-17 Sony Corporation Plasma noise and arcing suppressor apparatus and method for sputter deposition
WO1996031899A1 (en) 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
US5576939A (en) * 1995-05-05 1996-11-19 Drummond; Geoffrey N. Enhanced thin film DC plasma power supply
US5584974A (en) * 1995-10-20 1996-12-17 Eni Arc control and switching element protection for pulsed dc cathode sputtering power supply
US5682067A (en) * 1996-06-21 1997-10-28 Sierra Applied Sciences, Inc. Circuit for reversing polarity on electrodes
US5882492A (en) * 1996-06-21 1999-03-16 Sierra Applied Sciences, Inc. A.C. plasma processing system
DE19651615C1 (en) * 1996-12-12 1997-07-10 Fraunhofer Ges Forschung Sputter coating to produce carbon layer for e.g. magnetic heads
US5889391A (en) * 1997-11-07 1999-03-30 Sierra Applied Sciences, Inc. Power supply having combined regulator and pulsing circuits
US5910886A (en) * 1997-11-07 1999-06-08 Sierra Applied Sciences, Inc. Phase-shift power supply
US6011704A (en) * 1997-11-07 2000-01-04 Sierra Applied Sciences, Inc. Auto-ranging power supply
US5993613A (en) * 1997-11-07 1999-11-30 Sierra Applied Sciences, Inc. Method and apparatus for periodic polarity reversal during an active state
US5990668A (en) * 1997-11-07 1999-11-23 Sierra Applied Sciences, Inc. A.C. power supply having combined regulator and pulsing circuits

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1068972B (en) * 1959-11-12 Dortmund-Hörder Hüttenunion Aktiengesellschaft, Dortmund Device for operating high-current glow discharges in discharge vessels, in particular for treating bodies introduced into the discharge vessel
NL254958A (en) * 1959-08-17
CH561285A5 (en) * 1973-02-19 1975-04-30 Berghaus Bernhard Elektrophysi
FR2297927A1 (en) * 1975-01-17 1976-08-13 Anvar Thermochemical treatment of metal with ion bombardment - using a sealed discharge chamber, an electrode support and an arc detecting generator
FR2423914A1 (en) * 1978-04-20 1979-11-16 Aizenshtein Anatoly Pulsed power supply system - is for discharge equipment for treating workpieces and prevents glow discharge passing over into damaging arc discharge

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08510504A (en) * 1993-04-02 1996-11-05 アドバンスド エナージィ インダストリーズ，インコーポレイテッド Enhanced reactive DC sputtering system

Also Published As

Publication number Publication date
IT8047884A0 (en) 1980-02-13
PL222156A1 (en) 1980-11-03
DE3007420A1 (en) 1980-09-25
SU1198132A1 (en) 1985-12-15
DE3007420C2 (en) 1984-08-30
CH644398A5 (en) 1984-07-31
GR68091B (en) 1981-10-30
PL131348B1 (en) 1984-10-31
JPS6253593B2 (en) 1987-11-11
NO153320C (en) 1986-02-19
FR2451629B1 (en) 1984-12-07
ATA62880A (en) 1981-06-15
NO153320B (en) 1985-11-11
BG29362A1 (en) 1980-11-14
SE8000931L (en) 1980-09-12
GB2045553A (en) 1980-10-29
HU190769B (en) 1986-11-28
FR2451629A1 (en) 1980-10-10
DD235802A3 (en) 1986-05-21
YU29880A (en) 1983-06-30
SE440169B (en) 1985-07-15
AT365659B (en) 1982-02-10
IT1145262B (en) 1986-11-05
NO800613L (en) 1980-09-12
GB2045553B (en) 1983-08-17
CS215904B1 (en) 1982-10-29
YU41906B (en) 1988-02-29

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