JPS55122868A - Continuous deposition apparatus of coating - Google Patents
Continuous deposition apparatus of coatingInfo
- Publication number
- JPS55122868A JPS55122868A JP2900679A JP2900679A JPS55122868A JP S55122868 A JPS55122868 A JP S55122868A JP 2900679 A JP2900679 A JP 2900679A JP 2900679 A JP2900679 A JP 2900679A JP S55122868 A JPS55122868 A JP S55122868A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- coating
- chute
- air curtain
- smoky
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To continuously deposit a uniform coating having a stable performance on the surface of substrate, by heating smoky substance of coating raw material at a temperature not liquefied or decomposed thermally and also, rotating and dropping the substrate, such as porcelain, etc., heated at preheating zone in the coating deposition zone provided with an air curtain apparatus. CONSTITUTION:Columnar substrate, such as porcelain etc., is fed on the pallet conveyor 7 in the box-shaped electric furnace 6 from the supply part 8 through the chute 9 and is preheated. Next, the preheated substrate is dropped in the square- shaped zigzag chute 10 forming coating deposition zone heated by the heater 11 through the air curtain apparatus 14 at a temperature not liquefying or decomposing the smoky substance of coating raw material thermally. When the substrate is dropped rotating in the chute 10, the smoky substance is thermally decomposed on the surface of the substrate and the coating is deposited because the smoky substance is flowed from the branch pipe 12 to the branch pipe 13. Then, the substrate finished the coating deposition, is passed through the air curtain apparatus 15 and is put in the product case 16.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2900679A JPS55122868A (en) | 1979-03-13 | 1979-03-13 | Continuous deposition apparatus of coating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2900679A JPS55122868A (en) | 1979-03-13 | 1979-03-13 | Continuous deposition apparatus of coating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55122868A true JPS55122868A (en) | 1980-09-20 |
Family
ID=12264308
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2900679A Pending JPS55122868A (en) | 1979-03-13 | 1979-03-13 | Continuous deposition apparatus of coating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55122868A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02185975A (en) * | 1989-01-11 | 1990-07-20 | Hitachi Ltd | Formation of thin film |
-
1979
- 1979-03-13 JP JP2900679A patent/JPS55122868A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02185975A (en) * | 1989-01-11 | 1990-07-20 | Hitachi Ltd | Formation of thin film |
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