JPS55120133A - Apparatus for electron-beam lithography - Google Patents

Apparatus for electron-beam lithography

Info

Publication number
JPS55120133A
JPS55120133A JP2666379A JP2666379A JPS55120133A JP S55120133 A JPS55120133 A JP S55120133A JP 2666379 A JP2666379 A JP 2666379A JP 2666379 A JP2666379 A JP 2666379A JP S55120133 A JPS55120133 A JP S55120133A
Authority
JP
Japan
Prior art keywords
turned
blanking
fet13
fet12
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2666379A
Other languages
Japanese (ja)
Inventor
Sumio Hosaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP2666379A priority Critical patent/JPS55120133A/en
Publication of JPS55120133A publication Critical patent/JPS55120133A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To perform high-speed and highly accurate lithography by preventing the drift of a blanking-plate voltage when an electron beam is ON, by using a blanking circuit having a constitution wherein switching element is not conducted except the transient period. CONSTITUTION:When a positive-voltage signal is input to the base of a transistor 15, a FET14 is turned on, a FET12 is turned off, a FET13 is turned on, and the electric charge stored in blanking plates 3 is discharged through the FET13. The potential of the blanking plates becomes the ground potential, and an electron beam 2 becomes on. At this time, the FET13 is on, but the current is not flowed at all. When the base of the transistor 15 is grounded, FET14 is turned off, the FET12 is turned on, the FET13 is turned off, the voltage of the blanking plates 3 increases to the voltage Vcc, and the beam 2 becomes off. At this time, the current is not flowed in the FET12 at all. In this constitution, the drift of the electron beam due to the blanking circuit s prevented, and high-speed and highly accurate lithography can be performed.
JP2666379A 1979-03-09 1979-03-09 Apparatus for electron-beam lithography Pending JPS55120133A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2666379A JPS55120133A (en) 1979-03-09 1979-03-09 Apparatus for electron-beam lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2666379A JPS55120133A (en) 1979-03-09 1979-03-09 Apparatus for electron-beam lithography

Publications (1)

Publication Number Publication Date
JPS55120133A true JPS55120133A (en) 1980-09-16

Family

ID=12199643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2666379A Pending JPS55120133A (en) 1979-03-09 1979-03-09 Apparatus for electron-beam lithography

Country Status (1)

Country Link
JP (1) JPS55120133A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522156A (en) * 1975-06-24 1977-01-08 Hitachi Ltd Push-pull buffer circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522156A (en) * 1975-06-24 1977-01-08 Hitachi Ltd Push-pull buffer circuit

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