JPS55117245A - Heat resistive protecting tube for heat treating semiconductor element - Google Patents
Heat resistive protecting tube for heat treating semiconductor elementInfo
- Publication number
- JPS55117245A JPS55117245A JP2069480A JP2069480A JPS55117245A JP S55117245 A JPS55117245 A JP S55117245A JP 2069480 A JP2069480 A JP 2069480A JP 2069480 A JP2069480 A JP 2069480A JP S55117245 A JPS55117245 A JP S55117245A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- semiconductor element
- protecting tube
- resistive
- treating semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/10—Reaction chambers; Selection of materials therefor
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/08—Reaction chambers; Selection of materials therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7837—Direct response valves [i.e., check valve type]
- Y10T137/7898—Pivoted valves
- Y10T137/7902—Valve mounted on end of pipe
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7837—Direct response valves [i.e., check valve type]
- Y10T137/7904—Reciprocating valves
- Y10T137/7922—Spring biased
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2907371A DE2907371C2 (de) | 1979-02-24 | 1979-02-24 | Hochtemperaturfestes Schutzrohr für Wärmebehandlung von Halbleiterbauelementen |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55117245A true JPS55117245A (en) | 1980-09-09 |
Family
ID=6063899
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2069480A Pending JPS55117245A (en) | 1979-02-24 | 1980-02-22 | Heat resistive protecting tube for heat treating semiconductor element |
Country Status (5)
Country | Link |
---|---|
US (1) | US4367768A (ja) |
JP (1) | JPS55117245A (ja) |
DE (1) | DE2907371C2 (ja) |
FR (1) | FR2449972A1 (ja) |
GB (1) | GB2043837B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5862334A (ja) * | 1981-10-09 | 1983-04-13 | Mazda Motor Corp | エンジンのアイドル回転制御装置 |
DE3840588C1 (en) * | 1988-12-02 | 1990-02-22 | Westdeutsche Quarzschmelze Gmbh & Co. Kg, 2054 Geesthacht, De | Quartz glass container for the thermal treatment of semiconductor wafers |
US5492552A (en) * | 1994-03-03 | 1996-02-20 | Minnesota Mining And Manufacturing Company | Holder for annealing fiber optic coils |
US6000438A (en) * | 1998-02-13 | 1999-12-14 | Mcdermott Technology, Inc. | Phase change insulation for subsea flowlines |
US8540818B2 (en) * | 2009-04-28 | 2013-09-24 | Mitsubishi Materials Corporation | Polycrystalline silicon reactor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS543646U (ja) * | 1977-06-11 | 1979-01-11 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US418867A (en) * | 1890-01-07 | Discharge-door for steam digesters and retorts | ||
US554344A (en) * | 1896-02-11 | Clean-out valve | ||
US1246892A (en) * | 1917-03-08 | 1917-11-20 | Donnelly Mfg Company | Relief-valve. |
FR809569A (fr) * | 1935-08-09 | 1937-03-06 | Int Hydrogenation Patents Co | Soupape pour haute pression |
US2612406A (en) * | 1948-08-12 | 1952-09-30 | Kask Technical Corp | Atomizing nozzle |
US3274917A (en) * | 1964-02-17 | 1966-09-27 | Gleason Corp | Protective cover for exhaust pipes |
DE1558003A1 (de) * | 1967-05-31 | 1970-02-12 | Telefunken Patent | Diffusionsofen |
US3823685A (en) * | 1971-08-05 | 1974-07-16 | Ncr Co | Processing apparatus |
US3900597A (en) * | 1973-12-19 | 1975-08-19 | Motorola Inc | System and process for deposition of polycrystalline silicon with silane in vacuum |
US3984267A (en) * | 1974-07-26 | 1976-10-05 | Monsanto Company | Process and apparatus for diffusion of semiconductor materials |
US4173944A (en) * | 1977-05-20 | 1979-11-13 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh | Silverplated vapor deposition chamber |
-
1979
- 1979-02-24 DE DE2907371A patent/DE2907371C2/de not_active Expired
- 1979-12-20 GB GB7943967A patent/GB2043837B/en not_active Expired
-
1980
- 1980-02-13 FR FR8003189A patent/FR2449972A1/fr active Granted
- 1980-02-19 US US06/122,089 patent/US4367768A/en not_active Expired - Lifetime
- 1980-02-22 JP JP2069480A patent/JPS55117245A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS543646U (ja) * | 1977-06-11 | 1979-01-11 |
Also Published As
Publication number | Publication date |
---|---|
US4367768A (en) | 1983-01-11 |
GB2043837B (en) | 1983-03-23 |
FR2449972B1 (ja) | 1983-01-07 |
DE2907371B1 (de) | 1980-07-10 |
DE2907371C2 (de) | 1981-03-12 |
FR2449972A1 (fr) | 1980-09-19 |
GB2043837A (en) | 1980-10-08 |
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