JPS55109018A - Manufacture of elastic surface wave element - Google Patents

Manufacture of elastic surface wave element

Info

Publication number
JPS55109018A
JPS55109018A JP1703279A JP1703279A JPS55109018A JP S55109018 A JPS55109018 A JP S55109018A JP 1703279 A JP1703279 A JP 1703279A JP 1703279 A JP1703279 A JP 1703279A JP S55109018 A JPS55109018 A JP S55109018A
Authority
JP
Japan
Prior art keywords
surface wave
elastic surface
substrate
electrodes
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1703279A
Other languages
Japanese (ja)
Inventor
Takao Inoue
Kazuo Tatsuki
Osamu Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1703279A priority Critical patent/JPS55109018A/en
Publication of JPS55109018A publication Critical patent/JPS55109018A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PURPOSE:To secure the mass production of the high-quality elastic surface wave element, by removing the photosensitive material through exposure and then forming the elastic surface wave absorber with the residual photosensitive material. CONSTITUTION:Comb-line electrodes 9 and 10 for input/output are provided on substrate 8, and photosensitive material 11 is coated over the entire surface region. Then substrate 8 is exposed to remove materiall 11 on electrodes 9 and 10 as well as the necessary elastic surface wave propagation path. Thus material 11 is left only at the outside of electrodes 9 and 10, and residual material 11 functions as the elastic surface wave absorber to absrob the undesired elastic surface wave sent from electode 9 for input. Then substrate 8 thus obtained is divided along the grids shown by the solid lines, thus obtaining individual elastic surface wave element 12 finally.
JP1703279A 1979-02-15 1979-02-15 Manufacture of elastic surface wave element Pending JPS55109018A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1703279A JPS55109018A (en) 1979-02-15 1979-02-15 Manufacture of elastic surface wave element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1703279A JPS55109018A (en) 1979-02-15 1979-02-15 Manufacture of elastic surface wave element

Publications (1)

Publication Number Publication Date
JPS55109018A true JPS55109018A (en) 1980-08-21

Family

ID=11932654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1703279A Pending JPS55109018A (en) 1979-02-15 1979-02-15 Manufacture of elastic surface wave element

Country Status (1)

Country Link
JP (1) JPS55109018A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS598419A (en) * 1982-07-07 1984-01-17 Hitachi Ltd Surface acoustic wave device
EP0106189A2 (en) * 1982-09-21 1984-04-25 Siemens Aktiengesellschaft Surface-acoustic wave filter and method of producing the filter
JPS61192109A (en) * 1985-02-20 1986-08-26 Sanyo Electric Co Ltd Manufacture of surface acoustic wave device
US4931752A (en) * 1987-09-30 1990-06-05 Hewlett-Packard Company Polyimide damper for surface acoustic wave device
EP1152528A4 (en) * 1999-02-08 2006-07-05 Matsushita Electric Ind Co Ltd Surface acoustic wave device and method of manufacture thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS598419A (en) * 1982-07-07 1984-01-17 Hitachi Ltd Surface acoustic wave device
JPH0335850B2 (en) * 1982-07-07 1991-05-29 Hitachi Ltd
EP0106189A2 (en) * 1982-09-21 1984-04-25 Siemens Aktiengesellschaft Surface-acoustic wave filter and method of producing the filter
JPS61192109A (en) * 1985-02-20 1986-08-26 Sanyo Electric Co Ltd Manufacture of surface acoustic wave device
US4931752A (en) * 1987-09-30 1990-06-05 Hewlett-Packard Company Polyimide damper for surface acoustic wave device
EP1152528A4 (en) * 1999-02-08 2006-07-05 Matsushita Electric Ind Co Ltd Surface acoustic wave device and method of manufacture thereof

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