JPS55108736A - Method for maintenance of electron beam exposure device - Google Patents
Method for maintenance of electron beam exposure deviceInfo
- Publication number
- JPS55108736A JPS55108736A JP1559679A JP1559679A JPS55108736A JP S55108736 A JPS55108736 A JP S55108736A JP 1559679 A JP1559679 A JP 1559679A JP 1559679 A JP1559679 A JP 1559679A JP S55108736 A JPS55108736 A JP S55108736A
- Authority
- JP
- Japan
- Prior art keywords
- lubricant
- electron beam
- gas
- maintenance
- lubricant oil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
Abstract
PURPOSE:To eliminate charge up to be caused by lubricant oil by coating synthetic fluorine lubricant on mechanically sliding parts in a vacuum tank of an electron beam exposure device. CONSTITUTION:Synthetic fluorine lubricant is a lubricant oil devloped from the consideration of the fact that fluorine resin has a low friction coefficient and that it has no tackiness. It has relatively low cohesive energy, smaller than 1800(calmol<-1>) as expressed by Equation I. For maintenance, the sliding parts in the movable structures of the device are throughly cleaned and then they are coated with thin synthetic fluorine lubricant oil. As a result, even if a minute quantity of lubricant is evaporated, when it is exposed to an electron beam, it is decomposed into CF2 gas, CF3 gas, and O2 gas, and these gases are sucked into a exhaust device connected to vacuum tank 1 and are removed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1559679A JPS55108736A (en) | 1979-02-13 | 1979-02-13 | Method for maintenance of electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1559679A JPS55108736A (en) | 1979-02-13 | 1979-02-13 | Method for maintenance of electron beam exposure device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55108736A true JPS55108736A (en) | 1980-08-21 |
JPH0330257B2 JPH0330257B2 (en) | 1991-04-26 |
Family
ID=11893092
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1559679A Granted JPS55108736A (en) | 1979-02-13 | 1979-02-13 | Method for maintenance of electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55108736A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4734960U (en) * | 1971-05-14 | 1972-12-19 | ||
JPS5216561A (en) * | 1975-07-30 | 1977-02-07 | Montedison Spa | Selected perfluoroopolyether oil having extra high purity and low volatility |
-
1979
- 1979-02-13 JP JP1559679A patent/JPS55108736A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4734960U (en) * | 1971-05-14 | 1972-12-19 | ||
JPS5216561A (en) * | 1975-07-30 | 1977-02-07 | Montedison Spa | Selected perfluoroopolyether oil having extra high purity and low volatility |
Also Published As
Publication number | Publication date |
---|---|
JPH0330257B2 (en) | 1991-04-26 |
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