JPS5510779A - Method of exposing fluorescent screen of color-broun tube - Google Patents

Method of exposing fluorescent screen of color-broun tube

Info

Publication number
JPS5510779A
JPS5510779A JP8439978A JP8439978A JPS5510779A JP S5510779 A JPS5510779 A JP S5510779A JP 8439978 A JP8439978 A JP 8439978A JP 8439978 A JP8439978 A JP 8439978A JP S5510779 A JPS5510779 A JP S5510779A
Authority
JP
Japan
Prior art keywords
amplitude
photo
resist film
color
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8439978A
Other languages
Japanese (ja)
Inventor
Yasuo Iwasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8439978A priority Critical patent/JPS5510779A/en
Publication of JPS5510779A publication Critical patent/JPS5510779A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To alter a white current ratio easily and highly accurate, by making the amplitude of the reciprocating motion of a light source, which reciprocates in fixed amplitude in the longitudinal direction in the openings of a slot type shadow mask, differ to other color's cases about the exposure of at least one color.
CONSTITUTION: A photo-resist film for forming a photo-absorbing layer is exposed in amplitude larger than the amplitude of the optimum light source in the exposure of the photo-resist film to phosphor elements G and in amplitude smaller than the amplitude of the optimum light source in the exposure of the photo-resist film corresponding to remaining phosphor elements B, R when exposing said photo- resist film. A white current ratio can be changed because the luminous areas of excitation luminous portions GN become larger than those of excitaion luminous portions RN, BN.
COPYRIGHT: (C)1980,JPO&Japio
JP8439978A 1978-07-10 1978-07-10 Method of exposing fluorescent screen of color-broun tube Pending JPS5510779A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8439978A JPS5510779A (en) 1978-07-10 1978-07-10 Method of exposing fluorescent screen of color-broun tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8439978A JPS5510779A (en) 1978-07-10 1978-07-10 Method of exposing fluorescent screen of color-broun tube

Publications (1)

Publication Number Publication Date
JPS5510779A true JPS5510779A (en) 1980-01-25

Family

ID=13829492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8439978A Pending JPS5510779A (en) 1978-07-10 1978-07-10 Method of exposing fluorescent screen of color-broun tube

Country Status (1)

Country Link
JP (1) JPS5510779A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58128628A (en) * 1982-01-26 1983-08-01 Toshiba Corp Exposure unit for phosphor screen of color picture tube
KR20010097161A (en) * 2000-04-20 2001-11-08 김순택 Tension mask for color picture tube and method of manufacturing the same and exposure mask for making the tension mask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58128628A (en) * 1982-01-26 1983-08-01 Toshiba Corp Exposure unit for phosphor screen of color picture tube
JPH0418412B2 (en) * 1982-01-26 1992-03-27 Tokyo Shibaura Electric Co
KR20010097161A (en) * 2000-04-20 2001-11-08 김순택 Tension mask for color picture tube and method of manufacturing the same and exposure mask for making the tension mask

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