JPS5498268A - Method of inspecting position - Google Patents
Method of inspecting positionInfo
- Publication number
- JPS5498268A JPS5498268A JP15378478A JP15378478A JPS5498268A JP S5498268 A JPS5498268 A JP S5498268A JP 15378478 A JP15378478 A JP 15378478A JP 15378478 A JP15378478 A JP 15378478A JP S5498268 A JPS5498268 A JP S5498268A
- Authority
- JP
- Japan
- Prior art keywords
- inspecting position
- inspecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Drying Of Semiconductors (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/869,972 US4149085A (en) | 1978-01-16 | 1978-01-16 | Automatic overlay measurements using an electronic beam system as a measurement tool |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5498268A true JPS5498268A (en) | 1979-08-03 |
JPH0220921B2 JPH0220921B2 (ja) | 1990-05-11 |
Family
ID=25354531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15378478A Granted JPS5498268A (en) | 1978-01-16 | 1978-12-14 | Method of inspecting position |
Country Status (4)
Country | Link |
---|---|
US (1) | US4149085A (ja) |
EP (1) | EP0003038B1 (ja) |
JP (1) | JPS5498268A (ja) |
DE (1) | DE2860511D1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5795627A (en) * | 1980-12-05 | 1982-06-14 | Nippon Telegr & Teleph Corp <Ntt> | Method for arranging mark in electron beam exposure |
JPS59163506A (ja) * | 1983-03-09 | 1984-09-14 | Hitachi Ltd | 電子ビ−ム測長装置 |
JPS62150717A (ja) * | 1985-12-24 | 1987-07-04 | Mitsubishi Electric Corp | 微細パタ−ン形成方法 |
JPS63269007A (ja) * | 1987-04-10 | 1988-11-07 | エテック・システムズ・インコーポレイテッド | サブストレートの位置測定用検出器 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2937136A1 (de) * | 1979-09-13 | 1981-04-02 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und vorrichtung zur schnellen ablenkung eines korpuskularstrahls |
US4357540A (en) * | 1980-12-19 | 1982-11-02 | International Business Machines Corporation | Semiconductor device array mask inspection method and apparatus |
US4417203A (en) * | 1981-05-26 | 1983-11-22 | International Business Machines Corporation | System for contactless electrical property testing of multi-layer ceramics |
US4415851A (en) * | 1981-05-26 | 1983-11-15 | International Business Machines Corporation | System for contactless testing of multi-layer ceramics |
JPS57212754A (en) * | 1981-06-24 | 1982-12-27 | Hitachi Ltd | Electron-beam controller for electron microscope |
JPH11325877A (ja) * | 1998-03-31 | 1999-11-26 | Siemens Ag | 測定誤差を減少させるための方法及び装置 |
US6926524B2 (en) * | 1999-09-24 | 2005-08-09 | Cao Group, Inc. | Curing light |
US6362491B1 (en) | 1999-10-01 | 2002-03-26 | Taiwan Semiconductor Manufacturing Company | Method of overlay measurement in both X and Y directions for photo stitch process |
KR20010088997A (ko) * | 2001-08-31 | 2001-09-29 | 윤종태 | 반도체 공정에서 중첩도 측정 방법 |
US7379184B2 (en) * | 2004-10-18 | 2008-05-27 | Nanometrics Incorporated | Overlay measurement target |
US7808643B2 (en) * | 2005-02-25 | 2010-10-05 | Nanometrics Incorporated | Determining overlay error using an in-chip overlay target |
WO2006093722A2 (en) * | 2005-02-25 | 2006-09-08 | Accent Optical Technologies, Inc. | Methods and systems for determining overlay error based on target image symmetry |
JP6118505B2 (ja) * | 2012-04-04 | 2017-04-19 | 株式会社日立ハイテクノロジーズ | 位置ずれ計測装置及び位置ずれ計測方法ならびに位置ずれ計測装置を用いた走査電子顕微鏡 |
KR102234659B1 (ko) | 2013-10-29 | 2021-04-05 | 삼성전자주식회사 | 고에너지 전자 빔을 이용하여 인-셀 오버레이 오프셋을 측정할 수 있는 sem 장치와 그 방법 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5160455A (ja) * | 1974-11-22 | 1976-05-26 | Tokyo Shibaura Electric Co | |
JPS51148451A (en) * | 1975-06-14 | 1976-12-20 | Fujitsu Ltd | Basic position-error detection system |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1533755A (fr) * | 1966-08-16 | 1968-07-19 | Jeol Ltd | Dispositif pour le réglage du point de traitement dans un appareil à faisceau électrique ou analogue |
US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
US3875416A (en) * | 1970-06-30 | 1975-04-01 | Texas Instruments Inc | Methods and apparatus for the production of semiconductor devices by electron-beam patterning and devices produced thereby |
US3875414A (en) * | 1973-08-20 | 1975-04-01 | Secr Defence Brit | Methods suitable for use in or in connection with the production of microelectronic devices |
DE2424315C3 (de) * | 1974-05-18 | 1978-08-24 | Marbach, Walter, Bern | Einrichtung zur Umwandlung von Sonnenenergie in mechanische Energie |
US4056730A (en) * | 1976-07-12 | 1977-11-01 | International Business Machines Corporation | Apparatus for detecting registration marks on a target such as a semiconductor wafer |
-
1978
- 1978-01-16 US US05/869,972 patent/US4149085A/en not_active Expired - Lifetime
- 1978-12-14 JP JP15378478A patent/JPS5498268A/ja active Granted
- 1978-12-22 DE DE7878101821T patent/DE2860511D1/de not_active Expired
- 1978-12-22 EP EP78101821A patent/EP0003038B1/de not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5160455A (ja) * | 1974-11-22 | 1976-05-26 | Tokyo Shibaura Electric Co | |
JPS51148451A (en) * | 1975-06-14 | 1976-12-20 | Fujitsu Ltd | Basic position-error detection system |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5795627A (en) * | 1980-12-05 | 1982-06-14 | Nippon Telegr & Teleph Corp <Ntt> | Method for arranging mark in electron beam exposure |
JPS59163506A (ja) * | 1983-03-09 | 1984-09-14 | Hitachi Ltd | 電子ビ−ム測長装置 |
JPH0349042B2 (ja) * | 1983-03-09 | 1991-07-26 | Hitachi Ltd | |
JPS62150717A (ja) * | 1985-12-24 | 1987-07-04 | Mitsubishi Electric Corp | 微細パタ−ン形成方法 |
JPS63269007A (ja) * | 1987-04-10 | 1988-11-07 | エテック・システムズ・インコーポレイテッド | サブストレートの位置測定用検出器 |
Also Published As
Publication number | Publication date |
---|---|
DE2860511D1 (en) | 1981-04-02 |
JPH0220921B2 (ja) | 1990-05-11 |
EP0003038A2 (de) | 1979-07-25 |
EP0003038A3 (en) | 1979-08-08 |
EP0003038B1 (de) | 1981-02-25 |
US4149085A (en) | 1979-04-10 |
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