JPS5489623A - Heat resistant photoresist composition and production thereof - Google Patents

Heat resistant photoresist composition and production thereof

Info

Publication number
JPS5489623A
JPS5489623A JP15668777A JP15668777A JPS5489623A JP S5489623 A JPS5489623 A JP S5489623A JP 15668777 A JP15668777 A JP 15668777A JP 15668777 A JP15668777 A JP 15668777A JP S5489623 A JPS5489623 A JP S5489623A
Authority
JP
Japan
Prior art keywords
production
heat resistant
photoresist composition
resistant photoresist
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15668777A
Other languages
Japanese (ja)
Other versions
JPS6023341B2 (en
Inventor
Kaoru Oomura
Ichirou Shibazaki
Takeo Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP15668777A priority Critical patent/JPS6023341B2/en
Priority to GB7844576A priority patent/GB2008784B/en
Priority to US05/961,462 priority patent/US4208477A/en
Priority to FR7832525A priority patent/FR2409535A1/en
Priority to DE19782849981 priority patent/DE2849981A1/en
Publication of JPS5489623A publication Critical patent/JPS5489623A/en
Priority to US06/104,050 priority patent/US4316974A/en
Publication of JPS6023341B2 publication Critical patent/JPS6023341B2/en
Expired legal-status Critical Current

Links

JP15668777A 1977-11-17 1977-12-27 Heat-resistant photoresist composition and method for producing the same Expired JPS6023341B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP15668777A JPS6023341B2 (en) 1977-12-27 1977-12-27 Heat-resistant photoresist composition and method for producing the same
GB7844576A GB2008784B (en) 1977-11-17 1978-11-15 Heat resistant photoresist composition and process for preparing the same
US05/961,462 US4208477A (en) 1977-12-26 1978-11-16 Heat resistant photoresist composition and process for preparing the same
FR7832525A FR2409535A1 (en) 1977-11-17 1978-11-17 HEAT-RESISTANT "PHOTORESIST" COMPOSITION AND METHOD FOR PREPARING THE SAME
DE19782849981 DE2849981A1 (en) 1977-11-17 1978-11-17 HEAT-RESISTANT PHOTORESIS MATERIAL AND METHOD FOR MANUFACTURING IT
US06/104,050 US4316974A (en) 1977-12-26 1979-12-17 Polymers for use in heat resistant photoresist composition and process for preparing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15668777A JPS6023341B2 (en) 1977-12-27 1977-12-27 Heat-resistant photoresist composition and method for producing the same

Publications (2)

Publication Number Publication Date
JPS5489623A true JPS5489623A (en) 1979-07-16
JPS6023341B2 JPS6023341B2 (en) 1985-06-07

Family

ID=15633123

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15668777A Expired JPS6023341B2 (en) 1977-11-17 1977-12-27 Heat-resistant photoresist composition and method for producing the same

Country Status (1)

Country Link
JP (1) JPS6023341B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS572317A (en) * 1980-06-07 1982-01-07 Toshiba Chem Corp Thermosetting resin composition
JPS572316A (en) * 1980-06-05 1982-01-07 Toshiba Chem Corp Thermosetting resin composition
JPS5920304A (en) * 1982-07-27 1984-02-02 Nippon Oil & Fats Co Ltd Photopolymerization initiator composition
JPS6088939A (en) * 1983-10-21 1985-05-18 Shin Etsu Chem Co Ltd Photosensitive composition
JPS63318549A (en) * 1987-06-22 1988-12-27 Hitachi Ltd Heatresistant photosensitive polymer composition
JPH11327135A (en) * 1998-05-20 1999-11-26 Fujitsu Ltd Photosensitive heat-resistant resin composition, method for forming pattern of heat-resistant insulating film using this composition, and patterned heat-resistant insulating film obtained by this method
JP2006342335A (en) * 2005-05-11 2006-12-21 Hitachi Chem Co Ltd Polyamide-imide and resin composition

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS572316A (en) * 1980-06-05 1982-01-07 Toshiba Chem Corp Thermosetting resin composition
JPH029050B2 (en) * 1980-06-05 1990-02-28 Toshiba Chem Prod
JPS572317A (en) * 1980-06-07 1982-01-07 Toshiba Chem Corp Thermosetting resin composition
JPH029051B2 (en) * 1980-06-07 1990-02-28 Toshiba Chem Prod
JPS5920304A (en) * 1982-07-27 1984-02-02 Nippon Oil & Fats Co Ltd Photopolymerization initiator composition
JPH0463882B2 (en) * 1982-07-27 1992-10-13 Nippon Oils & Fats Co Ltd
JPS6088939A (en) * 1983-10-21 1985-05-18 Shin Etsu Chem Co Ltd Photosensitive composition
JPS63318549A (en) * 1987-06-22 1988-12-27 Hitachi Ltd Heatresistant photosensitive polymer composition
JPH11327135A (en) * 1998-05-20 1999-11-26 Fujitsu Ltd Photosensitive heat-resistant resin composition, method for forming pattern of heat-resistant insulating film using this composition, and patterned heat-resistant insulating film obtained by this method
JP2006342335A (en) * 2005-05-11 2006-12-21 Hitachi Chem Co Ltd Polyamide-imide and resin composition

Also Published As

Publication number Publication date
JPS6023341B2 (en) 1985-06-07

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