JPS5489492A - Optoelectronic sensor and method of fabricating same - Google Patents

Optoelectronic sensor and method of fabricating same

Info

Publication number
JPS5489492A
JPS5489492A JP15187478A JP15187478A JPS5489492A JP S5489492 A JPS5489492 A JP S5489492A JP 15187478 A JP15187478 A JP 15187478A JP 15187478 A JP15187478 A JP 15187478A JP S5489492 A JPS5489492 A JP S5489492A
Authority
JP
Japan
Prior art keywords
optoelectronic sensor
fabricating same
fabricating
same
optoelectronic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15187478A
Other languages
English (en)
Other versions
JPS6226187B2 (ja
Inventor
Herupusuto Hainaa
Pufuraideraa Hansuieruku
Kotsuho Ruudorufu
Chihanii Iene
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS5489492A publication Critical patent/JPS5489492A/ja
Publication of JPS6226187B2 publication Critical patent/JPS6226187B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/148—Charge coupled imagers
    • H01L27/14862—CID imagers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/112—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor
    • H01L31/113—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor
    • H01L31/1133—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor the device being a conductor-insulator-semiconductor diode or a CCD device

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
JP15187478A 1977-12-07 1978-12-07 Optoelectronic sensor and method of fabricating same Granted JPS5489492A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772754549 DE2754549A1 (de) 1977-12-07 1977-12-07 Optoelektronischer sensor nach dem prinzip der ladungsinjektion

Publications (2)

Publication Number Publication Date
JPS5489492A true JPS5489492A (en) 1979-07-16
JPS6226187B2 JPS6226187B2 (ja) 1987-06-08

Family

ID=6025530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15187478A Granted JPS5489492A (en) 1977-12-07 1978-12-07 Optoelectronic sensor and method of fabricating same

Country Status (6)

Country Link
US (1) US4266235A (ja)
EP (1) EP0003213B1 (ja)
JP (1) JPS5489492A (ja)
CA (1) CA1126843A (ja)
DE (2) DE2754549A1 (ja)
IT (1) IT1100522B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4327291A (en) * 1980-06-16 1982-04-27 Texas Instruments Incorporated Infrared charge injection device imaging system
US4568960A (en) * 1980-10-23 1986-02-04 Rockwell International Corporation Blocked impurity band detectors
FR2533371B1 (fr) * 1982-09-21 1985-12-13 Thomson Csf Structure de grille pour circuit integre comportant des elements du type grille-isolant-semi-conducteur et procede de realisation d'un circuit integre utilisant une telle structure
US7888200B2 (en) * 2007-01-31 2011-02-15 Sandisk 3D Llc Embedded memory in a CMOS circuit and methods of forming the same
US7868388B2 (en) * 2007-01-31 2011-01-11 Sandisk 3D Llc Embedded memory in a CMOS circuit and methods of forming the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3995302A (en) * 1973-05-07 1976-11-30 Fairchild Camera And Instrument Corporation Transfer gate-less photosensor configuration
US4001861A (en) * 1973-10-12 1977-01-04 The United States Of America As Represented By The Secretary Of The Navy Double-layer, polysilicon, two-phase, charge coupled device
US4024562A (en) * 1975-05-02 1977-05-17 General Electric Company Radiation sensing and charge storage devices
US3988613A (en) * 1975-05-02 1976-10-26 General Electric Company Radiation sensing and charge storage devices
US3950188A (en) * 1975-05-12 1976-04-13 Trw Inc. Method of patterning polysilicon
DE2554638A1 (de) * 1975-12-04 1977-06-16 Siemens Ag Verfahren zur erzeugung definierter boeschungswinkel bei einer aetzkante
DE2723933A1 (de) * 1975-12-04 1978-06-01 Siemens Ag Verfahren zur erzeugung definierter boeschungswinkel bei einer aetzkante
DE2703877C2 (de) * 1977-01-31 1982-06-03 Siemens Ag, 1000 Berlin Und 8000 Muenchen MIS-Transistor von kurzer Kanallänge und Verfahren zu seiner Herstellung
US4134031A (en) * 1977-09-19 1979-01-09 Rca Corporation Charge injection devices and arrays and systems including such devices

Also Published As

Publication number Publication date
DE2754549A1 (de) 1979-06-13
JPS6226187B2 (ja) 1987-06-08
EP0003213A2 (de) 1979-08-08
IT1100522B (it) 1985-09-28
EP0003213B1 (de) 1983-10-26
EP0003213A3 (en) 1979-09-05
US4266235A (en) 1981-05-05
IT7830437A0 (it) 1978-12-01
DE2862343D1 (en) 1983-12-01
CA1126843A (en) 1982-06-29

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