JPS5486481A - Production of metal oxide film - Google Patents

Production of metal oxide film

Info

Publication number
JPS5486481A
JPS5486481A JP15439077A JP15439077A JPS5486481A JP S5486481 A JPS5486481 A JP S5486481A JP 15439077 A JP15439077 A JP 15439077A JP 15439077 A JP15439077 A JP 15439077A JP S5486481 A JPS5486481 A JP S5486481A
Authority
JP
Japan
Prior art keywords
substance
nitrate
oxide film
metal
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15439077A
Other languages
Japanese (ja)
Other versions
JPS568117B2 (en
Inventor
Akiyuu Yamamoto
Masashi Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP15439077A priority Critical patent/JPS5486481A/en
Publication of JPS5486481A publication Critical patent/JPS5486481A/en
Publication of JPS568117B2 publication Critical patent/JPS568117B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Oxygen, Ozone, And Oxides In General (AREA)

Abstract

PURPOSE: To produce a metal oxide film of good quality at low temp. on a ground substance by electrodepositing desired metal ions formed in a low m.p. molten nitrate.
CONSTITUTION: Ground substance 1 as a cathode and carbon rod 2 as an anode are put in nitrate 3 contg. a desired metal ion source such as Sn(NO3)4 melted in electric furnace 6 and kept at a constant temp. A predetermined current is supplied between the electrodes from DC power source 5 to deposit metal ions formed in nitrate 3 on the surface of substance 1 by electrochemical reaction. The deposited metal is immediately oxidized with a number of NO-1 3 present around substance 1 to grow the metal as Sn2O3, etc. on substance 1. Nitrate 3 may be, e.g. a mixt. of 60 mol% of KNO3 with a m.p. of 134°C and 40 mol% of LiNO3. By this method, a metal oxide film of good quality can be formed at low temp., so formation of such a film is facilitated on a substance which tends to undergo thermal defects, e.g. a semiconductor, and a low m.p. substance.
COPYRIGHT: (C)1979,JPO&Japio
JP15439077A 1977-12-23 1977-12-23 Production of metal oxide film Granted JPS5486481A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15439077A JPS5486481A (en) 1977-12-23 1977-12-23 Production of metal oxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15439077A JPS5486481A (en) 1977-12-23 1977-12-23 Production of metal oxide film

Publications (2)

Publication Number Publication Date
JPS5486481A true JPS5486481A (en) 1979-07-10
JPS568117B2 JPS568117B2 (en) 1981-02-21

Family

ID=15583080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15439077A Granted JPS5486481A (en) 1977-12-23 1977-12-23 Production of metal oxide film

Country Status (1)

Country Link
JP (1) JPS5486481A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6110347A (en) * 1997-10-15 2000-08-29 Canon Kabushiki Kashia Method for the formation of an indium oxide film by electrodeposition process or electroless deposition process, a substrate provided with the indium oxide film for a semiconductor element, and a semiconductor element provided with the substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6110347A (en) * 1997-10-15 2000-08-29 Canon Kabushiki Kashia Method for the formation of an indium oxide film by electrodeposition process or electroless deposition process, a substrate provided with the indium oxide film for a semiconductor element, and a semiconductor element provided with the substrate
US6464762B1 (en) 1997-10-15 2002-10-15 Canon Kabushiki Kaisha Aqueous solution for the formation of an indium oxide film by electroless deposition

Also Published As

Publication number Publication date
JPS568117B2 (en) 1981-02-21

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