JPS5479034U - - Google Patents
Info
- Publication number
- JPS5479034U JPS5479034U JP15397277U JP15397277U JPS5479034U JP S5479034 U JPS5479034 U JP S5479034U JP 15397277 U JP15397277 U JP 15397277U JP 15397277 U JP15397277 U JP 15397277U JP S5479034 U JPS5479034 U JP S5479034U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15397277U JPS5749384Y2 (https=) | 1977-11-15 | 1977-11-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15397277U JPS5749384Y2 (https=) | 1977-11-15 | 1977-11-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5479034U true JPS5479034U (https=) | 1979-06-05 |
| JPS5749384Y2 JPS5749384Y2 (https=) | 1982-10-29 |
Family
ID=29141655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15397277U Expired JPS5749384Y2 (https=) | 1977-11-15 | 1977-11-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5749384Y2 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57194522A (en) * | 1981-05-27 | 1982-11-30 | Oki Electric Ind Co Ltd | Thermal treatment of semiconductor wafer |
| JPS63210501A (ja) * | 1987-02-26 | 1988-09-01 | 東京エレクトロン株式会社 | 蒸気発生方法及びその装置 |
| JPH01205425A (ja) * | 1988-02-10 | 1989-08-17 | Tel Sagami Ltd | 酸化炉 |
-
1977
- 1977-11-15 JP JP15397277U patent/JPS5749384Y2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57194522A (en) * | 1981-05-27 | 1982-11-30 | Oki Electric Ind Co Ltd | Thermal treatment of semiconductor wafer |
| JPS63210501A (ja) * | 1987-02-26 | 1988-09-01 | 東京エレクトロン株式会社 | 蒸気発生方法及びその装置 |
| JPH01205425A (ja) * | 1988-02-10 | 1989-08-17 | Tel Sagami Ltd | 酸化炉 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5749384Y2 (https=) | 1982-10-29 |