JPS5474100A - Fixation processing system of waste gas - Google Patents

Fixation processing system of waste gas

Info

Publication number
JPS5474100A
JPS5474100A JP14036577A JP14036577A JPS5474100A JP S5474100 A JPS5474100 A JP S5474100A JP 14036577 A JP14036577 A JP 14036577A JP 14036577 A JP14036577 A JP 14036577A JP S5474100 A JPS5474100 A JP S5474100A
Authority
JP
Japan
Prior art keywords
ion
sputtering
target
waste gas
feed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14036577A
Other languages
Japanese (ja)
Inventor
Masayuki Shimada
Tomotaka Terasawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14036577A priority Critical patent/JPS5474100A/en
Publication of JPS5474100A publication Critical patent/JPS5474100A/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

PURPOSE: To secure working efficiency and storage stability by feed fixation in simultaneous sputtering with storage target after the ionization of radiation waste gas.
CONSTITUTION: The waste gas enters into the ion source 4 from the radiation gas storage source 2 to make ionization, generating ion beam 14 accelerating with the accelerator 5, and injecting to the ion feed chamber 8 after passing through ion separation magnet 6 and shielding chamber 7. The ion feed chamber 8 is provided with shuttering target 9 and the storage target 12 against thereto. When the ion beam 14 injects against the sputtering target 9, the sputtering atom 10 is emitted to adhere with the storage target 12. Accordingly, this enables the ion feeding and the fixation of feed ion by sputtering to achieve automatically in simultaneous performance.
COPYRIGHT: (C)1979,JPO&Japio
JP14036577A 1977-11-22 1977-11-22 Fixation processing system of waste gas Pending JPS5474100A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14036577A JPS5474100A (en) 1977-11-22 1977-11-22 Fixation processing system of waste gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14036577A JPS5474100A (en) 1977-11-22 1977-11-22 Fixation processing system of waste gas

Publications (1)

Publication Number Publication Date
JPS5474100A true JPS5474100A (en) 1979-06-13

Family

ID=15267119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14036577A Pending JPS5474100A (en) 1977-11-22 1977-11-22 Fixation processing system of waste gas

Country Status (1)

Country Link
JP (1) JPS5474100A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8379789B2 (en) 2004-05-30 2013-02-19 Pebble Bed Modular Reactor (Proprietary) Limited Nuclear plant

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8379789B2 (en) 2004-05-30 2013-02-19 Pebble Bed Modular Reactor (Proprietary) Limited Nuclear plant

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