JPS547274A - Method of producing semiconductor surface oxide film - Google Patents

Method of producing semiconductor surface oxide film

Info

Publication number
JPS547274A
JPS547274A JP7309877A JP7309877A JPS547274A JP S547274 A JPS547274 A JP S547274A JP 7309877 A JP7309877 A JP 7309877A JP 7309877 A JP7309877 A JP 7309877A JP S547274 A JPS547274 A JP S547274A
Authority
JP
Japan
Prior art keywords
oxide film
semiconductor surface
surface oxide
producing semiconductor
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7309877A
Other languages
Japanese (ja)
Other versions
JPS5751972B2 (en
Inventor
Takuo Sugano
Kimiyoshi Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO DAIGAKU
Original Assignee
TOKYO DAIGAKU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO DAIGAKU filed Critical TOKYO DAIGAKU
Priority to JP7309877A priority Critical patent/JPS547274A/en
Publication of JPS547274A publication Critical patent/JPS547274A/en
Publication of JPS5751972B2 publication Critical patent/JPS5751972B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)
  • Led Devices (AREA)
JP7309877A 1977-06-20 1977-06-20 Method of producing semiconductor surface oxide film Granted JPS547274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7309877A JPS547274A (en) 1977-06-20 1977-06-20 Method of producing semiconductor surface oxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7309877A JPS547274A (en) 1977-06-20 1977-06-20 Method of producing semiconductor surface oxide film

Publications (2)

Publication Number Publication Date
JPS547274A true JPS547274A (en) 1979-01-19
JPS5751972B2 JPS5751972B2 (en) 1982-11-05

Family

ID=13508507

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7309877A Granted JPS547274A (en) 1977-06-20 1977-06-20 Method of producing semiconductor surface oxide film

Country Status (1)

Country Link
JP (1) JPS547274A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931032A (en) * 1982-08-12 1984-02-18 Mitsubishi Electric Corp Plasma oxide film forming device
JPS5934639A (en) * 1982-08-21 1984-02-25 Mitsubishi Electric Corp Forming device for silicon nitride film
JPH05243577A (en) * 1992-02-26 1993-09-21 Seiko Epson Corp Manufacture of thin film transistor

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SOLID STATE TECHNOLOGY=1970 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931032A (en) * 1982-08-12 1984-02-18 Mitsubishi Electric Corp Plasma oxide film forming device
JPS5934639A (en) * 1982-08-21 1984-02-25 Mitsubishi Electric Corp Forming device for silicon nitride film
JPH05243577A (en) * 1992-02-26 1993-09-21 Seiko Epson Corp Manufacture of thin film transistor

Also Published As

Publication number Publication date
JPS5751972B2 (en) 1982-11-05

Similar Documents

Publication Publication Date Title
JPS53148273A (en) Method of producing semiconductor
JPS5370668A (en) Method of forming nntype region in silicon substrate
JPS542671A (en) Method of producing semiconductor
JPS5487175A (en) Method of fabricating semiconductor
JPS5446485A (en) Method of producing semiconductor
JPS53107287A (en) Method of producing semiconductor
JPS53128286A (en) Method of producing semiconductor
JPS5427376A (en) Method of producing semiconductor
JPS53128273A (en) Method of producing semiconductor
JPS546784A (en) Method of producing semiconductor
JPS5419677A (en) Method of producing semiconductor
JPS53138292A (en) Method of producing semiconductor
JPS5422159A (en) Method of producing semiconductor
JPS5458375A (en) Method of producing semiconductor
JPS548468A (en) Method of producing semiconductor
JPS54109779A (en) Method of fabricating semiconductor
JPS53135279A (en) Method of producing semiconductor surface
JPS5390776A (en) Method of producing semiconductor
JPS547274A (en) Method of producing semiconductor surface oxide film
JPS5451388A (en) Method of producing semiconductor
JPS53124965A (en) Method of producing semiconductor
JPS53126258A (en) Method of producing silicon wafer
JPS543466A (en) Method of producing semiconductor
JPS5394190A (en) Method of producing semiconductor
JPS54985A (en) Method of producing semiconductor