JPS5472036A - Electron beam resist - Google Patents
Electron beam resistInfo
- Publication number
- JPS5472036A JPS5472036A JP13932077A JP13932077A JPS5472036A JP S5472036 A JPS5472036 A JP S5472036A JP 13932077 A JP13932077 A JP 13932077A JP 13932077 A JP13932077 A JP 13932077A JP S5472036 A JPS5472036 A JP S5472036A
- Authority
- JP
- Japan
- Prior art keywords
- monomer
- electron beam
- mma
- copolymer
- copolymerized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
PURPOSE: To enlarge difference in solubility of irradiated parts and nonirradiated parts, if any slight irradiation amount, in spite of cross linking type, by incorporating a copolymer consisting mainly of a depolymerization type polymer.
CONSTITUTION: A monomer Mo polymerizing to form an electron beam depolimerizing type polymer, such as methyl methacrylate MMA, and a 1W15mol% on Mo, of a monomer M1 having a functional group R1 retained even after polymerization, such as methacrylic amide are copolymerized to form a copolymer I. MMA and a monomer M2 having a functional group R2 capable of combining with group R1 of monomer, M1 such as glycidyl methacrylate, in an amount of 1W15mole% of MMA are copolymerized to form a copolymer II. These copolymers I and II are dissolved in a proper solvent and the undissolved part is filtered off. This resist is converted into a three-dimensional structure by heat treatment and insolubilized, and this, inturn, is converted into a two-dimensional polymer by electron beam irradiation.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52139320A JPS607777B2 (en) | 1977-11-18 | 1977-11-18 | electron beam resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52139320A JPS607777B2 (en) | 1977-11-18 | 1977-11-18 | electron beam resist |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5472036A true JPS5472036A (en) | 1979-06-09 |
JPS607777B2 JPS607777B2 (en) | 1985-02-27 |
Family
ID=15242554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52139320A Expired JPS607777B2 (en) | 1977-11-18 | 1977-11-18 | electron beam resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS607777B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02197846A (en) * | 1989-01-26 | 1990-08-06 | Toray Ind Inc | Radiation sensitive positive type resist |
-
1977
- 1977-11-18 JP JP52139320A patent/JPS607777B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02197846A (en) * | 1989-01-26 | 1990-08-06 | Toray Ind Inc | Radiation sensitive positive type resist |
Also Published As
Publication number | Publication date |
---|---|
JPS607777B2 (en) | 1985-02-27 |
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