JPS5472036A - Electron beam resist - Google Patents

Electron beam resist

Info

Publication number
JPS5472036A
JPS5472036A JP13932077A JP13932077A JPS5472036A JP S5472036 A JPS5472036 A JP S5472036A JP 13932077 A JP13932077 A JP 13932077A JP 13932077 A JP13932077 A JP 13932077A JP S5472036 A JPS5472036 A JP S5472036A
Authority
JP
Japan
Prior art keywords
monomer
electron beam
mma
copolymer
copolymerized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13932077A
Other languages
Japanese (ja)
Other versions
JPS607777B2 (en
Inventor
Kunio Hibino
Takakatsu Morimoto
Kenichi Takeyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP52139320A priority Critical patent/JPS607777B2/en
Publication of JPS5472036A publication Critical patent/JPS5472036A/en
Publication of JPS607777B2 publication Critical patent/JPS607777B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

PURPOSE: To enlarge difference in solubility of irradiated parts and nonirradiated parts, if any slight irradiation amount, in spite of cross linking type, by incorporating a copolymer consisting mainly of a depolymerization type polymer.
CONSTITUTION: A monomer Mo polymerizing to form an electron beam depolimerizing type polymer, such as methyl methacrylate MMA, and a 1W15mol% on Mo, of a monomer M1 having a functional group R1 retained even after polymerization, such as methacrylic amide are copolymerized to form a copolymer I. MMA and a monomer M2 having a functional group R2 capable of combining with group R1 of monomer, M1 such as glycidyl methacrylate, in an amount of 1W15mole% of MMA are copolymerized to form a copolymer II. These copolymers I and II are dissolved in a proper solvent and the undissolved part is filtered off. This resist is converted into a three-dimensional structure by heat treatment and insolubilized, and this, inturn, is converted into a two-dimensional polymer by electron beam irradiation.
COPYRIGHT: (C)1979,JPO&Japio
JP52139320A 1977-11-18 1977-11-18 electron beam resist Expired JPS607777B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52139320A JPS607777B2 (en) 1977-11-18 1977-11-18 electron beam resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52139320A JPS607777B2 (en) 1977-11-18 1977-11-18 electron beam resist

Publications (2)

Publication Number Publication Date
JPS5472036A true JPS5472036A (en) 1979-06-09
JPS607777B2 JPS607777B2 (en) 1985-02-27

Family

ID=15242554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52139320A Expired JPS607777B2 (en) 1977-11-18 1977-11-18 electron beam resist

Country Status (1)

Country Link
JP (1) JPS607777B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02197846A (en) * 1989-01-26 1990-08-06 Toray Ind Inc Radiation sensitive positive type resist

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02197846A (en) * 1989-01-26 1990-08-06 Toray Ind Inc Radiation sensitive positive type resist

Also Published As

Publication number Publication date
JPS607777B2 (en) 1985-02-27

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