JPS5464543A - Photocurable composition - Google Patents
Photocurable compositionInfo
- Publication number
- JPS5464543A JPS5464543A JP12676578A JP12676578A JPS5464543A JP S5464543 A JPS5464543 A JP S5464543A JP 12676578 A JP12676578 A JP 12676578A JP 12676578 A JP12676578 A JP 12676578A JP S5464543 A JPS5464543 A JP S5464543A
- Authority
- JP
- Japan
- Prior art keywords
- photocurable composition
- photocurable
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/44—Iso-indoles; Hydrogenated iso-indoles
- C07D209/48—Iso-indoles; Hydrogenated iso-indoles with oxygen atoms in positions 1 and 3, e.g. phthalimide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3415—Five-membered rings
- C08K5/3417—Five-membered rings condensed with carbocyclic rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Indole Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Photoreceptors In Electrophotography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1258177 | 1977-10-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5464543A true JPS5464543A (en) | 1979-05-24 |
Family
ID=4384392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12676578A Pending JPS5464543A (en) | 1977-10-14 | 1978-10-14 | Photocurable composition |
Country Status (6)
Country | Link |
---|---|
US (1) | US4197133A (ja) |
EP (1) | EP0001597B1 (ja) |
JP (1) | JPS5464543A (ja) |
CA (1) | CA1123543A (ja) |
DE (1) | DE2861208D1 (ja) |
ES (1) | ES474176A1 (ja) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55104264A (en) * | 1979-02-05 | 1980-08-09 | Teijin Ltd | Bezyl ketal derivative |
JPS56137347A (en) * | 1980-03-29 | 1981-10-27 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition for dry development |
GB2092164B (en) * | 1980-12-17 | 1984-12-05 | Hitachi Ltd | Loght or radiation-sensitive polymer composition |
US4459414A (en) * | 1981-04-08 | 1984-07-10 | Ciba-Geigy Corporation | Tetrasubstituted phthalic acid derivatives, and a process for their preparation |
EP0156966B1 (en) * | 1981-07-20 | 1988-10-19 | Teijin Limited | Wholly aromatic polyester composition and process for producing it |
US4666958A (en) * | 1982-01-07 | 1987-05-19 | Ppg Industries, Inc. | Polymeric compositions containing polyhalophthalimidoalkyl-functional carbonates |
US4414396A (en) * | 1982-01-07 | 1983-11-08 | Ppg Industries, Inc. | Polyhalophthalimidoalkyl-functional carbonates and haloformates |
US4515964A (en) * | 1982-01-07 | 1985-05-07 | Ppg Industries, Inc. | Polyhalophthalimidoalkyl-functional carbonates |
EP0113313B1 (de) * | 1982-11-04 | 1987-07-15 | Ciba-Geigy Ag | In Gegenwart von Sensibilisatoren unter Lichteinwirkung vernetzbare Stoffgemische und deren Verwendung |
US4615968A (en) * | 1982-11-04 | 1986-10-07 | Ciba-Geigy Corporation | Compositions of matter which crosslink under the action of light in the presence of sensitizers |
US4656116A (en) * | 1983-10-12 | 1987-04-07 | Ciba-Geigy Corporation | Radiation-sensitive coating composition |
US4569897A (en) * | 1984-01-16 | 1986-02-11 | Rohm And Haas Company | Negative photoresist compositions with polyglutarimide polymer |
US4631249A (en) * | 1984-01-16 | 1986-12-23 | Rohm & Haas Company | Process for forming thermally stable negative images on surfaces utilizing polyglutarimide polymer in photoresist composition |
FR2583534B1 (fr) * | 1985-06-18 | 1990-06-22 | Labo Electronique Physique | Composition pour obtenir une resine photosensible de haute resolution, developpable par plasma et procede photolithographique mettant en oeuvre cette resine. |
US4830953A (en) * | 1986-08-18 | 1989-05-16 | Ciba-Geigy Corporation | Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating |
US5015704A (en) * | 1989-06-29 | 1991-05-14 | General Electric Company | Reactively capped polyarylene sulfide and method and intermediates for their preparation |
JPH04182466A (ja) * | 1990-11-19 | 1992-06-30 | Mitsubishi Gas Chem Co Inc | ビストリメリティックイミド類の製造方法 |
US5854302A (en) * | 1993-04-29 | 1998-12-29 | The Dow Chemical Company | Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins |
US5536994A (en) * | 1995-04-19 | 1996-07-16 | Chunghwa Picture Tubes, Ltd. | Photoresist for cathode ray tubes |
US5849809A (en) * | 1996-08-29 | 1998-12-15 | Xerox Corporation | Hydroxyalkylated high performance curable polymers |
KR19990061716A (ko) * | 1997-12-31 | 1999-07-26 | 윤종용 | 비스(디알킬말레이미드) 유도체 및 이로부터 형성된 광통신용 폴리에테르이미드 |
US7285363B2 (en) * | 2002-11-08 | 2007-10-23 | The University Of Connecticut | Photoactivators, methods of use, and the articles derived therefrom |
US20110144373A1 (en) * | 2009-12-10 | 2011-06-16 | Surmodics, Inc. | Water-soluble degradable photo-crosslinker |
US10315987B2 (en) | 2010-12-13 | 2019-06-11 | Surmodics, Inc. | Photo-crosslinker |
AU2012312423A1 (en) * | 2011-09-21 | 2014-04-03 | Dow Global Technologies Llc | Azide crosslinked and physically crosslinked polymers for membrane separation |
CA2884012C (en) * | 2012-09-20 | 2020-09-01 | Dow Global Technologies Llc | Radiation cured membranes derived from polymers that are co-reactive with azide crosslinking agent(s) |
CA2974946C (en) | 2015-01-27 | 2023-01-10 | Dow Global Technologies Llc | Separation of nitrogen from hydrocarbon gas using pyrolyzed sulfonated macroporous ion exchange resin |
WO2016122843A2 (en) | 2015-01-27 | 2016-08-04 | Dow Global Technologies Llc | Separation of hydrocarbons using regenerable macroporous alkylene-bridged adsorbent |
CA2981012A1 (fr) | 2017-10-02 | 2019-04-02 | Hydro-Quebec | Polymeres et composes soufres et leur utilisation comme materiau actif d'electrode |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE52852C (de) * | A. MICHAUD in Paris, Boulevard Jourdan 20 | Verfahren der Herstellung von Zeugdruck- und Präge-Musterwalzen ohne Löthnaht auf galvanoplastischem Wege | ||
US2852379A (en) * | 1955-05-04 | 1958-09-16 | Eastman Kodak Co | Azide resin photolithographic composition |
GB892811A (en) * | 1957-04-18 | 1962-03-28 | Kodak Ltd | Improvements in diarylazido-compounds and photo-mechanical processes for lithographic printing |
US2940853A (en) * | 1958-08-21 | 1960-06-14 | Eastman Kodak Co | Azide sensitized resin photographic resist |
BE595534A (ja) * | 1959-10-02 | |||
US3287128A (en) * | 1963-04-22 | 1966-11-22 | Martin Mariatta Corp | Lithographic plates and coatings |
US3812162A (en) * | 1970-09-29 | 1974-05-21 | Ibm | Azides |
US3856531A (en) * | 1971-08-02 | 1974-12-24 | Eastman Kodak Co | Photographic compositions and processes |
US3749713A (en) * | 1972-02-28 | 1973-07-31 | Ibm | Novel azide compounds |
JPS5140452B2 (ja) * | 1973-07-23 | 1976-11-04 | ||
SU503855A1 (ru) * | 1973-09-14 | 1976-02-25 | Ленинградский Ордена Трудового Красного Знамени Технологический Институт Имени Ленсовета | Замещенные 2,6-бис/4-азидобензилиден/циклогексанона как светочувствительна добавка дл фоторезистов и светокопировальных слоев |
US4092345A (en) * | 1976-07-30 | 1978-05-30 | Cities Service Company | (Cyclo)alkylenediammonium-bis-tetrahalophthalates |
-
1978
- 1978-10-05 US US05/948,856 patent/US4197133A/en not_active Expired - Lifetime
- 1978-10-06 EP EP78101081A patent/EP0001597B1/de not_active Expired
- 1978-10-06 DE DE7878101081T patent/DE2861208D1/de not_active Expired
- 1978-10-12 CA CA313,229A patent/CA1123543A/en not_active Expired
- 1978-10-13 ES ES474176A patent/ES474176A1/es not_active Expired
- 1978-10-14 JP JP12676578A patent/JPS5464543A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
US4197133A (en) | 1980-04-08 |
DE2861208D1 (en) | 1981-12-24 |
ES474176A1 (es) | 1979-10-16 |
EP0001597A1 (de) | 1979-05-02 |
CA1123543A (en) | 1982-05-11 |
EP0001597B1 (de) | 1981-10-21 |
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