JPS5463293A - Thermal head - Google Patents
Thermal headInfo
- Publication number
- JPS5463293A JPS5463293A JP12948277A JP12948277A JPS5463293A JP S5463293 A JPS5463293 A JP S5463293A JP 12948277 A JP12948277 A JP 12948277A JP 12948277 A JP12948277 A JP 12948277A JP S5463293 A JPS5463293 A JP S5463293A
- Authority
- JP
- Japan
- Prior art keywords
- film
- crb
- sputtering
- resistor
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electronic Switches (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Non-Adjustable Resistors (AREA)
- Conductive Materials (AREA)
Abstract
PURPOSE: To raise oxidation resistance, the stability of resistance value, and resistivity by forming CrB2 theremogenous resistor by electronic beam deposition or sputtering and then by covering and then by covering it with a protective layer with conductor.
CONSTITUTION: The surface of the base plate 1, as, for example, of ceramic glass, grazed ceramica, etc., is formed with the CrB2 thin film theremogenous resistor 2, the Al or Au conductor 3 for power supply, and the protective layer 4 of SiO2, Ta2O5, Al2O3, MgO, etc., or a multilayer of these, for protecting the resistor 2 and the conductor 3. The formation of the CrB2 film is made by either electronic beam deposition or sputtering. When the base plate being processed for forming the film is heated to 200 to 500°C, the adhesiveness of the film is made better, and also the heating of the base plate covered with the film at 200 at 650°C results in the regulation and stabilization of resistance value. The sputtering is made in Ar when the target used is CrB2 or Cr and B, but the sputtering is made in a mixed gas of Ar and diborane when the target is Cr alone.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52129482A JPS6022801B2 (en) | 1977-10-28 | 1977-10-28 | thermal head |
US05/906,359 US4296309A (en) | 1977-05-19 | 1978-05-15 | Thermal head |
DE19782821950 DE2821950A1 (en) | 1977-05-19 | 1978-05-19 | Head for thermal printing with stable resistance - obtd. by sputtering a metal boride resistance heating element onto a glazed substrate |
US06/552,013 US4545881A (en) | 1977-05-19 | 1983-11-16 | Method for producing electro-thermal transducer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52129482A JPS6022801B2 (en) | 1977-10-28 | 1977-10-28 | thermal head |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5463293A true JPS5463293A (en) | 1979-05-22 |
JPS6022801B2 JPS6022801B2 (en) | 1985-06-04 |
Family
ID=15010565
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52129482A Expired JPS6022801B2 (en) | 1977-05-19 | 1977-10-28 | thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6022801B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6242203U (en) * | 1985-08-30 | 1987-03-13 |
-
1977
- 1977-10-28 JP JP52129482A patent/JPS6022801B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS6022801B2 (en) | 1985-06-04 |
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