JPS5456391A - Thin-film making apparatus - Google Patents

Thin-film making apparatus

Info

Publication number
JPS5456391A
JPS5456391A JP12239977A JP12239977A JPS5456391A JP S5456391 A JPS5456391 A JP S5456391A JP 12239977 A JP12239977 A JP 12239977A JP 12239977 A JP12239977 A JP 12239977A JP S5456391 A JPS5456391 A JP S5456391A
Authority
JP
Japan
Prior art keywords
electrode
shutter
substrate
target
mesh
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12239977A
Other languages
Japanese (ja)
Other versions
JPS5752955B2 (en
Inventor
Yoshio Ito
Yasuhiro Torii
Harue Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP12239977A priority Critical patent/JPS5456391A/en
Publication of JPS5456391A publication Critical patent/JPS5456391A/en
Publication of JPS5752955B2 publication Critical patent/JPS5752955B2/ja
Granted legal-status Critical Current

Links

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Abstract

PURPOSE: To achieve the reduction in excess energies at the time when sputter particles arrive at substrate and obtain good quality thin-films by providing a mesh-form electrode having pores in opposition to a target electrode and letting the sputter particles deposit on the substrate.
CONSTITUTION: A mesh-form electrode 6 having pores of, e.g., #50 to #500 is opposedly provided to a target electrode 4 and a shutter 5 is interposed between the mesh electrode 6 and target electrode 4. A substrate 7 is mounted on the opposite side of the target electrode 4, with the meah electrode 6 as a boundary. First with the shutter 5 being held closed, discharge is caused bwtween the shutter 5 and target electrode 4, by which the deposits on the target surface are removed. After this, the shutter is opened and discharge is cused between the mesh electrode 6 and target electrode 4, by which sputtering for thin film production is accomplished. Thereby, the even and good quality thin film may be obtained on the substrate
COPYRIGHT: (C)1979,JPO&Japio
JP12239977A 1977-10-14 1977-10-14 Thin-film making apparatus Granted JPS5456391A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12239977A JPS5456391A (en) 1977-10-14 1977-10-14 Thin-film making apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12239977A JPS5456391A (en) 1977-10-14 1977-10-14 Thin-film making apparatus

Publications (2)

Publication Number Publication Date
JPS5456391A true JPS5456391A (en) 1979-05-07
JPS5752955B2 JPS5752955B2 (en) 1982-11-10

Family

ID=14834820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12239977A Granted JPS5456391A (en) 1977-10-14 1977-10-14 Thin-film making apparatus

Country Status (1)

Country Link
JP (1) JPS5456391A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5597471A (en) * 1979-01-20 1980-07-24 Fujitsu General Ltd Sputtering apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49120877A (en) * 1973-03-20 1974-11-19
JPS5017945U (en) * 1973-06-13 1975-02-27

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49120877A (en) * 1973-03-20 1974-11-19
JPS5017945U (en) * 1973-06-13 1975-02-27

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5597471A (en) * 1979-01-20 1980-07-24 Fujitsu General Ltd Sputtering apparatus

Also Published As

Publication number Publication date
JPS5752955B2 (en) 1982-11-10

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