Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filedfiledCritical
Priority to JP1802472ApriorityCriticalpatent/JPS5429901B2/ja
Priority to GB861573Aprioritypatent/GB1430193A/en
Priority to DE19732309072prioritypatent/DE2309072C3/de
Publication of JPS4888949ApublicationCriticalpatent/JPS4888949A/ja
Publication of JPS5429901B2publicationCriticalpatent/JPS5429901B2/ja
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure
(AREA)
Microscoopes, Condenser
(AREA)
Light Sources And Details Of Projection-Printing Devices
(AREA)