JPS5426875B2 - - Google Patents
Info
- Publication number
- JPS5426875B2 JPS5426875B2 JP1085877A JP1085877A JPS5426875B2 JP S5426875 B2 JPS5426875 B2 JP S5426875B2 JP 1085877 A JP1085877 A JP 1085877A JP 1085877 A JP1085877 A JP 1085877A JP S5426875 B2 JPS5426875 B2 JP S5426875B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30472—Controlling the beam
- H01J2237/30483—Scanning
- H01J2237/30488—Raster scan
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31776—Shaped beam
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US65542776A | 1976-02-05 | 1976-02-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52103967A JPS52103967A (en) | 1977-08-31 |
JPS5426875B2 true JPS5426875B2 (US06248540-20010619-C00021.png) | 1979-09-06 |
Family
ID=24628844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1085877A Granted JPS52103967A (en) | 1976-02-05 | 1977-02-04 | Method of iluminating surface of material to be machined and apparatus therefor |
Country Status (5)
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5251871A (en) * | 1975-10-23 | 1977-04-26 | Rikagaku Kenkyusho | Projecting method for charge particle beams |
NL177578C (nl) * | 1976-05-14 | 1985-10-16 | Thomson Csf | Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel. |
JPS5316578A (en) * | 1976-07-30 | 1978-02-15 | Toshiba Corp | Electron beam exposure apparatus |
CA1166766A (en) * | 1977-02-23 | 1984-05-01 | Hans C. Pfeiffer | Method and apparatus for forming a variable size electron beam |
CA1100237A (en) * | 1977-03-23 | 1981-04-28 | Roger F.W. Pease | Multiple electron beam exposure system |
GB1598219A (en) * | 1977-08-10 | 1981-09-16 | Ibm | Electron beam system |
JPS5442980A (en) * | 1977-09-10 | 1979-04-05 | Cho Lsi Gijutsu Kenkyu Kumiai | Electron beam unit |
JPS5463681A (en) * | 1977-10-29 | 1979-05-22 | Nippon Aviotronics Kk | Electron beam exposure device |
JPS5610926A (en) * | 1979-07-06 | 1981-02-03 | Hitachi Ltd | Electron beam drawing device |
JPS5744684Y2 (US06248540-20010619-C00021.png) * | 1981-01-22 | 1982-10-02 | ||
US4445041A (en) * | 1981-06-02 | 1984-04-24 | Hewlett-Packard Company | Electron beam blanker |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
JPS5320391A (en) * | 1976-08-09 | 1978-02-24 | Becton Dickinson Co | Blood inspection apparatus |
JPS5829490A (ja) * | 1981-08-18 | 1983-02-21 | 松下電器産業株式会社 | 脱水機 |
JPS5845742A (ja) * | 1981-08-31 | 1983-03-17 | ヘキスト・アクチエンゲゼルシヤフト | 酢酸メチル及び/又はジメチルエ−テルをカルボニル化する際に生じる汚染された触媒溶液を浄化及び回収する方法 |
-
1977
- 1977-01-24 GB GB283677A patent/GB1557924A/en not_active Expired
- 1977-01-27 CA CA000270570A patent/CA1149086A/en not_active Expired
- 1977-02-02 FR FR7702869A patent/FR2340616A1/fr not_active Withdrawn
- 1977-02-03 DE DE19772704441 patent/DE2704441A1/de active Pending
- 1977-02-04 JP JP1085877A patent/JPS52103967A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
JPS5320391A (en) * | 1976-08-09 | 1978-02-24 | Becton Dickinson Co | Blood inspection apparatus |
JPS5829490A (ja) * | 1981-08-18 | 1983-02-21 | 松下電器産業株式会社 | 脱水機 |
JPS5845742A (ja) * | 1981-08-31 | 1983-03-17 | ヘキスト・アクチエンゲゼルシヤフト | 酢酸メチル及び/又はジメチルエ−テルをカルボニル化する際に生じる汚染された触媒溶液を浄化及び回収する方法 |
Also Published As
Publication number | Publication date |
---|---|
FR2340616A1 (fr) | 1977-09-02 |
JPS52103967A (en) | 1977-08-31 |
GB1557924A (en) | 1979-12-19 |
DE2704441A1 (de) | 1977-08-11 |
CA1149086A (en) | 1983-06-28 |