JPS5421563Y2 - - Google Patents

Info

Publication number
JPS5421563Y2
JPS5421563Y2 JP4265875U JP4265875U JPS5421563Y2 JP S5421563 Y2 JPS5421563 Y2 JP S5421563Y2 JP 4265875 U JP4265875 U JP 4265875U JP 4265875 U JP4265875 U JP 4265875U JP S5421563 Y2 JPS5421563 Y2 JP S5421563Y2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4265875U
Other languages
Japanese (ja)
Other versions
JPS51122158U (en)van
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4265875U priority Critical patent/JPS5421563Y2/ja
Priority to GB4345975A priority patent/GB1483966A/en
Priority to DE2547552A priority patent/DE2547552B2/de
Priority to US05/625,041 priority patent/US4152478A/en
Publication of JPS51122158U publication Critical patent/JPS51122158U/ja
Priority to US06/011,917 priority patent/US4217855A/en
Application granted granted Critical
Publication of JPS5421563Y2 publication Critical patent/JPS5421563Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP4265875U 1974-10-23 1975-03-29 Expired JPS5421563Y2 (en)van)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP4265875U JPS5421563Y2 (en)van) 1975-03-29 1975-03-29
GB4345975A GB1483966A (en) 1974-10-23 1975-10-22 Vapourized-metal cluster ion source and ionized-cluster beam deposition
DE2547552A DE2547552B2 (de) 1974-10-23 1975-10-23 Schichtaufdampfverfahren und -einrichtung
US05/625,041 US4152478A (en) 1974-10-23 1975-10-23 Ionized-cluster deposited on a substrate and method of depositing ionized cluster on a substrate
US06/011,917 US4217855A (en) 1974-10-23 1979-02-13 Vaporized-metal cluster ion source and ionized-cluster beam deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4265875U JPS5421563Y2 (en)van) 1975-03-29 1975-03-29

Publications (2)

Publication Number Publication Date
JPS51122158U JPS51122158U (en)van) 1976-10-04
JPS5421563Y2 true JPS5421563Y2 (en)van) 1979-07-31

Family

ID=28172324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4265875U Expired JPS5421563Y2 (en)van) 1974-10-23 1975-03-29

Country Status (1)

Country Link
JP (1) JPS5421563Y2 (en)van)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5046882B2 (ja) 2007-11-21 2012-10-10 三菱重工業株式会社 インライン式成膜装置
JP2010121215A (ja) * 2010-01-14 2010-06-03 Semiconductor Energy Lab Co Ltd 蒸着装置および蒸着方法

Also Published As

Publication number Publication date
JPS51122158U (en)van) 1976-10-04

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