JPS5417623B2 - - Google Patents
Info
- Publication number
- JPS5417623B2 JPS5417623B2 JP11954175A JP11954175A JPS5417623B2 JP S5417623 B2 JPS5417623 B2 JP S5417623B2 JP 11954175 A JP11954175 A JP 11954175A JP 11954175 A JP11954175 A JP 11954175A JP S5417623 B2 JPS5417623 B2 JP S5417623B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Pulse Circuits (AREA)
- Electronic Switches (AREA)
- Relay Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11954175A JPS5243353A (en) | 1975-10-02 | 1975-10-02 | Timer circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11954175A JPS5243353A (en) | 1975-10-02 | 1975-10-02 | Timer circuit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5243353A JPS5243353A (en) | 1977-04-05 |
| JPS5417623B2 true JPS5417623B2 (sl) | 1979-07-02 |
Family
ID=14763834
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11954175A Granted JPS5243353A (en) | 1975-10-02 | 1975-10-02 | Timer circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5243353A (sl) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3275857A1 (en) | 2016-07-25 | 2018-01-31 | Shin-Etsu Chemical Co., Ltd. | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film |
| EP3315504A1 (en) | 2016-10-27 | 2018-05-02 | Shin-Etsu Chemical Co., Ltd. | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film |
| EP3382742A1 (en) | 2017-03-27 | 2018-10-03 | Shin-Etsu Chemical Co., Ltd. | Semiconductor device, making method, and laminate |
| EP3382743A1 (en) | 2017-03-27 | 2018-10-03 | Shin-Etsu Chemical Co., Ltd. | Laminate and making method |
| EP3495434A1 (en) | 2017-12-05 | 2019-06-12 | Shin-Etsu Chemical Co., Ltd. | Novel tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts |
| EP3604390A1 (en) | 2018-08-01 | 2020-02-05 | Shin-Etsu Chemical Co., Ltd. | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH064882Y2 (ja) * | 1988-01-27 | 1994-02-09 | 石川島播磨重工業株式会社 | 浮体式下水処理設備 |
-
1975
- 1975-10-02 JP JP11954175A patent/JPS5243353A/ja active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3275857A1 (en) | 2016-07-25 | 2018-01-31 | Shin-Etsu Chemical Co., Ltd. | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film |
| EP3315504A1 (en) | 2016-10-27 | 2018-05-02 | Shin-Etsu Chemical Co., Ltd. | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film |
| EP3382742A1 (en) | 2017-03-27 | 2018-10-03 | Shin-Etsu Chemical Co., Ltd. | Semiconductor device, making method, and laminate |
| EP3382743A1 (en) | 2017-03-27 | 2018-10-03 | Shin-Etsu Chemical Co., Ltd. | Laminate and making method |
| EP3495434A1 (en) | 2017-12-05 | 2019-06-12 | Shin-Etsu Chemical Co., Ltd. | Novel tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts |
| KR20190066591A (ko) | 2017-12-05 | 2019-06-13 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 신규 테트라카르복실산이무수물, 폴리이미드 수지 및 그 제조 방법, 감광성 수지 조성물, 패턴 형성 방법 및 경화 피막 형성 방법, 층간 절연막, 표면 보호막, 전자 부품 |
| EP3604390A1 (en) | 2018-08-01 | 2020-02-05 | Shin-Etsu Chemical Co., Ltd. | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts |
| KR20200014709A (ko) | 2018-08-01 | 2020-02-11 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 폴리아미드, 폴리아미드이미드, 폴리이미드 구조를 포함하는 중합체, 감광성 수지 조성물, 패턴 형성 방법, 감광성 드라이 필름 및 전기·전자 부품 보호용 피막 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5243353A (en) | 1977-04-05 |