JPS54144491A - Polyether polyol composition - Google Patents

Polyether polyol composition

Info

Publication number
JPS54144491A
JPS54144491A JP5398479A JP5398479A JPS54144491A JP S54144491 A JPS54144491 A JP S54144491A JP 5398479 A JP5398479 A JP 5398479A JP 5398479 A JP5398479 A JP 5398479A JP S54144491 A JPS54144491 A JP S54144491A
Authority
JP
Japan
Prior art keywords
polyether polyol
polyol composition
composition
polyether
polyol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5398479A
Other languages
English (en)
Other versions
JPS621966B2 (ja
Inventor
Ii Kimubooru Maikeru
Efu Fuainri Ansonii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Goodyear Tire and Rubber Co
Original Assignee
Goodyear Tire and Rubber Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Goodyear Tire and Rubber Co filed Critical Goodyear Tire and Rubber Co
Publication of JPS54144491A publication Critical patent/JPS54144491A/ja
Publication of JPS621966B2 publication Critical patent/JPS621966B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C08F299/065—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes from polyurethanes with side or terminal unsaturations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)
JP5398479A 1978-05-01 1979-05-01 Polyether polyol composition Granted JPS54144491A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/902,011 US4221646A (en) 1978-05-01 1978-05-01 Treated polyetherurethane photopolymer composition containing triaryl phosphine

Publications (2)

Publication Number Publication Date
JPS54144491A true JPS54144491A (en) 1979-11-10
JPS621966B2 JPS621966B2 (ja) 1987-01-17

Family

ID=25415180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5398479A Granted JPS54144491A (en) 1978-05-01 1979-05-01 Polyether polyol composition

Country Status (9)

Country Link
US (1) US4221646A (ja)
JP (1) JPS54144491A (ja)
AR (1) AR228725A1 (ja)
AU (1) AU530033B2 (ja)
CA (1) CA1143096A (ja)
DE (1) DE2917748A1 (ja)
FR (1) FR2424941B2 (ja)
IT (1) IT1162626B (ja)
ZA (1) ZA791454B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62502848A (ja) * 1985-05-17 1987-11-12 エム・アンド・ティ　ケミカルズ　インコ−ポレ−テッド 水性アルカリ現像可能−紫外線キュアリング可能であり半田マスク被膜の形成に有用なウレタンアクリレ−ト化合物及び組成物
JP2009242736A (ja) * 2008-03-31 2009-10-22 Sanyo Chem Ind Ltd 活性エネルギー線硬化性樹脂組成物

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3131766A1 (de) * 1981-08-11 1983-02-24 Basf Ag, 6700 Ludwigshafen Photopolymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefformen mittels dieses aufzeichnungsmaterials
DE3328285A1 (de) * 1983-08-05 1985-02-21 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von lichtgehaerteten schichten mit definierter haerte
US5118779A (en) * 1989-10-10 1992-06-02 Polymedica Industries, Inc. Hydrophilic polyurethane elastomers
US5328805A (en) * 1992-08-28 1994-07-12 W. R. Grace & Co.-Conn. Aqueous developable photosensitive polyurethane-(meth)acrylate
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
US5557308A (en) * 1994-07-08 1996-09-17 E. I. Du Pont De Nemours And Company Ink jet print head photoresist layer having durable adhesion characteristics
JPH08220737A (ja) * 1994-12-13 1996-08-30 Hercules Inc フレキソ印刷用の軟質レリーフ感光性ポリマー版面
WO1996018932A1 (en) 1994-12-13 1996-06-20 Macdermid Imaging Technology, Inc. Photosensitive compositions and clean running photopolymer printing plates therefrom
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US5744514A (en) * 1996-10-31 1998-04-28 Borden Chemical, Inc. Coated optical fibers having a reduced content of extractable and volatile material
US6007967A (en) * 1997-12-11 1999-12-28 Polyfibron Technologies, Inc. Methods for off-contact imaging solid printing plates
FR2773162B1 (fr) 1997-12-29 2000-02-11 Essilor Int Composition photopolymerisable a base de monomeres polyiso (thio)cyanates et de monomeres a proton labile, comprenant un agent photoamorceur et un agent d'activation de la photopolymerisation et artciles d'optique obtenus
WO2007079541A1 (en) * 2006-01-12 2007-07-19 John Lyndon Garnett Radiation curable system

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1054533A (ja) * 1964-06-25
US3933682A (en) * 1973-01-31 1976-01-20 Sun Chemical Corporation Photopolymerization co-initiator systems
US4057431A (en) * 1975-09-29 1977-11-08 The Goodyear Tire & Rubber Company Ethylenically polyurethane unsaturated composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62502848A (ja) * 1985-05-17 1987-11-12 エム・アンド・ティ　ケミカルズ　インコ−ポレ−テッド 水性アルカリ現像可能−紫外線キュアリング可能であり半田マスク被膜の形成に有用なウレタンアクリレ−ト化合物及び組成物
JP2009242736A (ja) * 2008-03-31 2009-10-22 Sanyo Chem Ind Ltd 活性エネルギー線硬化性樹脂組成物

Also Published As

Publication number Publication date
FR2424941B2 (fr) 1985-09-13
AR228725A1 (es) 1983-04-15
IT7948809A0 (it) 1979-04-23
AU530033B2 (en) 1983-06-30
DE2917748A1 (de) 1979-11-15
CA1143096A (en) 1983-03-15
ZA791454B (en) 1980-08-27
AU4586379A (en) 1979-11-08
IT1162626B (it) 1987-04-01
FR2424941A2 (fr) 1979-11-30
JPS621966B2 (ja) 1987-01-17
US4221646A (en) 1980-09-09

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