JPS54142144A - Control of dry etching - Google Patents

Control of dry etching

Info

Publication number
JPS54142144A
JPS54142144A JP5079478A JP5079478A JPS54142144A JP S54142144 A JPS54142144 A JP S54142144A JP 5079478 A JP5079478 A JP 5079478A JP 5079478 A JP5079478 A JP 5079478A JP S54142144 A JPS54142144 A JP S54142144A
Authority
JP
Japan
Prior art keywords
etching
amplified
emission
amplifiers
comparator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5079478A
Other languages
Japanese (ja)
Other versions
JPS627274B2 (en
Inventor
Kunio Hanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP5079478A priority Critical patent/JPS54142144A/en
Publication of JPS54142144A publication Critical patent/JPS54142144A/en
Publication of JPS627274B2 publication Critical patent/JPS627274B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To perform highly reliable etching by finding the completion point of etching without incurring external influence by comparing the intensity of the emission spectrum of material to be treated upon etching with that of the emission spectrum of etching gas. CONSTITUTION:The discharge emission during etching is divided spectrally by the monochromator 23 through the viewing window 21 and the condenser 22, converted photoelectrically by the photomultiplier tube 24, amplified by the DC amplifier 25, and then added to the comparator 26. The emission of etching agent is sent to the phototransistor 34 through the viewing window 31, the condenser 32, and filter 33, amplified by the DC amplifier 35, and then added to the comparator 26. The outputs of the amplifiers 25 and 35 are differentially amplified and then operated differentially by the decision circuit 27. And, at a time when the reduction with time of difference in voltage between the amplifiers 25 and 35 becomes zero, a signal is sent out in order to interrupt the power of the high frequency power source 41 for stopping discharge. This method enables one to prevent errancy in the decision of etching completion point.
JP5079478A 1978-04-27 1978-04-27 Control of dry etching Granted JPS54142144A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5079478A JPS54142144A (en) 1978-04-27 1978-04-27 Control of dry etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5079478A JPS54142144A (en) 1978-04-27 1978-04-27 Control of dry etching

Publications (2)

Publication Number Publication Date
JPS54142144A true JPS54142144A (en) 1979-11-06
JPS627274B2 JPS627274B2 (en) 1987-02-16

Family

ID=12868697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5079478A Granted JPS54142144A (en) 1978-04-27 1978-04-27 Control of dry etching

Country Status (1)

Country Link
JP (1) JPS54142144A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56114329A (en) * 1980-02-15 1981-09-08 Chiyou Lsi Gijutsu Kenkyu Kumiai Method for sensing time of completion of dry etching
JPS56115536A (en) * 1980-02-15 1981-09-10 Chiyou Lsi Gijutsu Kenkyu Kumiai Detecting method for finish time of dry etching reaction
JPS59181537A (en) * 1983-03-31 1984-10-16 Fujitsu Ltd Etching method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135639A (en) * 1974-09-20 1976-03-26 Hitachi Ltd HIMAKUNOPURAZUMA ETSUCHINGUSHORISHUTENKENSHUTSUHO

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135639A (en) * 1974-09-20 1976-03-26 Hitachi Ltd HIMAKUNOPURAZUMA ETSUCHINGUSHORISHUTENKENSHUTSUHO

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56114329A (en) * 1980-02-15 1981-09-08 Chiyou Lsi Gijutsu Kenkyu Kumiai Method for sensing time of completion of dry etching
JPS56115536A (en) * 1980-02-15 1981-09-10 Chiyou Lsi Gijutsu Kenkyu Kumiai Detecting method for finish time of dry etching reaction
JPS59181537A (en) * 1983-03-31 1984-10-16 Fujitsu Ltd Etching method
JPH0343775B2 (en) * 1983-03-31 1991-07-03 Fujitsu Ltd

Also Published As

Publication number Publication date
JPS627274B2 (en) 1987-02-16

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