JPS54141346A - Silver-copper alloy plating method - Google Patents
Silver-copper alloy plating methodInfo
- Publication number
- JPS54141346A JPS54141346A JP5054378A JP5054378A JPS54141346A JP S54141346 A JPS54141346 A JP S54141346A JP 5054378 A JP5054378 A JP 5054378A JP 5054378 A JP5054378 A JP 5054378A JP S54141346 A JPS54141346 A JP S54141346A
- Authority
- JP
- Japan
- Prior art keywords
- silver
- plating
- soln
- copper
- copper alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Manufacture And Refinement Of Metals (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
PURPOSE: To form a silver-copper alloy film with superior smoothness and sulfurization resistance without any environmental pollution problem by carrying out periodic reverse electrolysis using an electrolytic soln. contg. a silver salt, a copper salt, an iodide and polyethylene glycol in silver-copper alloy plating.
CONSTITUTION: A plating soln. is prepared as follows: KI is dissolved in distilled water, and a silver salt such as silver nitrate is added to form a complex. To the soln. are further added CuI, citric acid and a commercially available antioxidant, and finally added 0.1W10 g/l of polyethylene glycol as a brightener. A desirable plating bath compsn. and plating conditions are shown by the list. A silver anode plate and a material to be plated are dipped in the above plating soln., and periodic reverse electrolysis (normal/reverse= 3/1W10/1 and reverse time below 2 sec) is carried out to form a silver-copper monophase alloy film with superior flatness and sulfurization resistance suitable for use as contact points for various electronic parts. This method prevents environmental pollution due to cyanogen ion in effluent.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5054378A JPS54141346A (en) | 1978-04-26 | 1978-04-26 | Silver-copper alloy plating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5054378A JPS54141346A (en) | 1978-04-26 | 1978-04-26 | Silver-copper alloy plating method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54141346A true JPS54141346A (en) | 1979-11-02 |
Family
ID=12861920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5054378A Pending JPS54141346A (en) | 1978-04-26 | 1978-04-26 | Silver-copper alloy plating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54141346A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07252684A (en) * | 1994-02-05 | 1995-10-03 | W C Heraeus Gmbh | Silver-tin alloy plating deposition bath |
CN110396705A (en) * | 2019-08-07 | 2019-11-01 | 中国科学院合肥物质科学研究院 | The method of the porous silver of electrodeposited nanocrystalline |
-
1978
- 1978-04-26 JP JP5054378A patent/JPS54141346A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07252684A (en) * | 1994-02-05 | 1995-10-03 | W C Heraeus Gmbh | Silver-tin alloy plating deposition bath |
CN110396705A (en) * | 2019-08-07 | 2019-11-01 | 中国科学院合肥物质科学研究院 | The method of the porous silver of electrodeposited nanocrystalline |
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