JPS54118235A - Photopolymerizable element and production - Google Patents

Photopolymerizable element and production

Info

Publication number
JPS54118235A
JPS54118235A JP565979A JP565979A JPS54118235A JP S54118235 A JPS54118235 A JP S54118235A JP 565979 A JP565979 A JP 565979A JP 565979 A JP565979 A JP 565979A JP S54118235 A JPS54118235 A JP S54118235A
Authority
JP
Japan
Prior art keywords
production
photopolymerizable element
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP565979A
Other languages
Japanese (ja)
Other versions
JPS5640815B2 (en
Inventor
Pooru Herudo Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS54118235A publication Critical patent/JPS54118235A/en
Publication of JPS5640815B2 publication Critical patent/JPS5640815B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
JP565979A 1978-01-23 1979-01-23 Photopolymerizable element and production Granted JPS54118235A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87159578A 1978-01-23 1978-01-23

Publications (2)

Publication Number Publication Date
JPS54118235A true JPS54118235A (en) 1979-09-13
JPS5640815B2 JPS5640815B2 (en) 1981-09-24

Family

ID=25357754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP565979A Granted JPS54118235A (en) 1978-01-23 1979-01-23 Photopolymerizable element and production

Country Status (4)

Country Link
JP (1) JPS54118235A (en)
DE (1) DE2901956C2 (en)
FR (1) FR2415324A1 (en)
GB (1) GB2013355B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784366A (en) * 1993-08-24 1995-03-31 E I Du Pont De Nemours & Co Preparation of photosensitive composition can be toned and multicolor image

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0756942A1 (en) * 1995-07-26 1997-02-05 Eastman Kodak Company Laser ablative imaging method
EP0755802A1 (en) * 1995-07-26 1997-01-29 Eastman Kodak Company Laser ablative imaging method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB921529A (en) * 1958-07-04 1963-03-20 Algraphy Ltd Improvements in or relating to the processing of pre-sensitised lithographic printing plates
GB1101444A (en) * 1965-04-09 1968-01-31 Algraphy Ltd Improvements in planographic plate image reinforcement
US3276360A (en) * 1965-05-17 1966-10-04 Eatman Kodak Company Lithographic image lacquer
GB1135334A (en) * 1966-05-03 1968-12-04 Howson Ltd W H Image strengthener for lithographic plates
NL6917606A (en) * 1968-11-21 1970-05-25
FR2361680A1 (en) * 1976-08-11 1978-03-10 Du Pont Planographic printing block - consisting of carrier coated with polymer layer contg. image of hydrophilic or oleophilic zones

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784366A (en) * 1993-08-24 1995-03-31 E I Du Pont De Nemours & Co Preparation of photosensitive composition can be toned and multicolor image

Also Published As

Publication number Publication date
FR2415324B1 (en) 1981-10-02
DE2901956A1 (en) 1979-07-26
JPS5640815B2 (en) 1981-09-24
GB2013355B (en) 1983-01-06
GB2013355A (en) 1979-08-08
DE2901956C2 (en) 1983-08-18
FR2415324A1 (en) 1979-08-17

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