JPS5411725B2 - - Google Patents

Info

Publication number
JPS5411725B2
JPS5411725B2 JP7028274A JP7028274A JPS5411725B2 JP S5411725 B2 JPS5411725 B2 JP S5411725B2 JP 7028274 A JP7028274 A JP 7028274A JP 7028274 A JP7028274 A JP 7028274A JP S5411725 B2 JPS5411725 B2 JP S5411725B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7028274A
Other languages
Japanese (ja)
Other versions
JPS51948A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7028274A priority Critical patent/JPS51948A/ja
Publication of JPS51948A publication Critical patent/JPS51948A/ja
Publication of JPS5411725B2 publication Critical patent/JPS5411725B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
JP7028274A 1974-06-21 1974-06-21 Hotomasukuno seizohoho Granted JPS51948A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7028274A JPS51948A (en) 1974-06-21 1974-06-21 Hotomasukuno seizohoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7028274A JPS51948A (en) 1974-06-21 1974-06-21 Hotomasukuno seizohoho

Publications (2)

Publication Number Publication Date
JPS51948A JPS51948A (en) 1976-01-07
JPS5411725B2 true JPS5411725B2 (enrdf_load_stackoverflow) 1979-05-17

Family

ID=13426966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7028274A Granted JPS51948A (en) 1974-06-21 1974-06-21 Hotomasukuno seizohoho

Country Status (1)

Country Link
JP (1) JPS51948A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5616676A (en) * 1979-07-21 1981-02-17 Hokuriku Denki Kogyo Kk Preparation of minute pattern
JPH0833655B2 (ja) * 1989-10-18 1996-03-29 三菱電機株式会社 フォトマスク修正方法
JP2539945B2 (ja) * 1990-09-07 1996-10-02 三菱電機株式会社 フォトマスクの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE793605A (fr) * 1972-01-03 1973-05-02 Rca Corp Appareil et procede pour corriger un masque photographique defectueux
US3814641A (en) * 1972-07-20 1974-06-04 Instr Inc Process of fabricating silicon photomask

Also Published As

Publication number Publication date
JPS51948A (en) 1976-01-07

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