JPS5396677A - Reflective mask for forming pattern - Google Patents

Reflective mask for forming pattern

Info

Publication number
JPS5396677A
JPS5396677A JP1029277A JP1029277A JPS5396677A JP S5396677 A JPS5396677 A JP S5396677A JP 1029277 A JP1029277 A JP 1029277A JP 1029277 A JP1029277 A JP 1029277A JP S5396677 A JPS5396677 A JP S5396677A
Authority
JP
Japan
Prior art keywords
reflective mask
forming pattern
pattern
forming
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1029277A
Other languages
English (en)
Inventor
Seiichi Iwamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP1029277A priority Critical patent/JPS5396677A/ja
Publication of JPS5396677A publication Critical patent/JPS5396677A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP1029277A 1977-02-03 1977-02-03 Reflective mask for forming pattern Pending JPS5396677A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1029277A JPS5396677A (en) 1977-02-03 1977-02-03 Reflective mask for forming pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1029277A JPS5396677A (en) 1977-02-03 1977-02-03 Reflective mask for forming pattern

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP59142236A Division JPS60121718A (ja) 1984-07-11 1984-07-11 パタ−ン形成用マスク

Publications (1)

Publication Number Publication Date
JPS5396677A true JPS5396677A (en) 1978-08-24

Family

ID=11746210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1029277A Pending JPS5396677A (en) 1977-02-03 1977-02-03 Reflective mask for forming pattern

Country Status (1)

Country Link
JP (1) JPS5396677A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61228447A (ja) * 1985-04-02 1986-10-11 Nippon Kogaku Kk <Nikon> フオトリソグラフイ用反射型マスク
JPH01175731A (ja) * 1987-12-29 1989-07-12 Canon Inc 反射型マスクおよび該反射型マスクを用いた露光装置と露光方法
JPH01175736A (ja) * 1987-12-29 1989-07-12 Canon Inc 反射型マスクならびにこれを用いた露光方法
JP2018531422A (ja) * 2015-10-09 2018-10-25 エーエスエムエル ネザーランズ ビー．ブイ． 検査及びメトロロジのための方法及び装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61228447A (ja) * 1985-04-02 1986-10-11 Nippon Kogaku Kk <Nikon> フオトリソグラフイ用反射型マスク
JPH01175731A (ja) * 1987-12-29 1989-07-12 Canon Inc 反射型マスクおよび該反射型マスクを用いた露光装置と露光方法
JPH01175736A (ja) * 1987-12-29 1989-07-12 Canon Inc 反射型マスクならびにこれを用いた露光方法
JP2018531422A (ja) * 2015-10-09 2018-10-25 エーエスエムエル ネザーランズ ビー．ブイ． 検査及びメトロロジのための方法及び装置

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