JPS538309A - Removing method for sulfer in metalic manganese - Google Patents
Removing method for sulfer in metalic manganeseInfo
- Publication number
- JPS538309A JPS538309A JP8248576A JP8248576A JPS538309A JP S538309 A JPS538309 A JP S538309A JP 8248576 A JP8248576 A JP 8248576A JP 8248576 A JP8248576 A JP 8248576A JP S538309 A JPS538309 A JP S538309A
- Authority
- JP
- Japan
- Prior art keywords
- sulfer
- metalic
- manganese
- removing method
- electrolytic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacture And Refinement Of Metals (AREA)
Abstract
PURPOSE: To remove S contained in electrolytic Mn by adding Mn oxide or Mn carbonate to high purity crushed electrolytic Mn and by fusing them.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8248576A JPS538309A (en) | 1976-07-13 | 1976-07-13 | Removing method for sulfer in metalic manganese |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8248576A JPS538309A (en) | 1976-07-13 | 1976-07-13 | Removing method for sulfer in metalic manganese |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS538309A true JPS538309A (en) | 1978-01-25 |
Family
ID=13775804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8248576A Pending JPS538309A (en) | 1976-07-13 | 1976-07-13 | Removing method for sulfer in metalic manganese |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS538309A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012072498A (en) * | 2011-11-16 | 2012-04-12 | Jx Nippon Mining & Metals Corp | Sputtering target consisting of high purity manganese and thin film consisting of high purity manganese which is formed by sputtering |
WO2013105291A1 (en) | 2012-01-10 | 2013-07-18 | Jx日鉱日石金属株式会社 | High-purity manganese and method for producing same |
KR20150125721A (en) | 2013-10-25 | 2015-11-09 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | Method for manufacturing high purity manganese and high purity manganese |
KR20150126662A (en) | 2013-10-25 | 2015-11-12 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | Method for manufacturing high purity manganese and high purity manganese |
-
1976
- 1976-07-13 JP JP8248576A patent/JPS538309A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012072498A (en) * | 2011-11-16 | 2012-04-12 | Jx Nippon Mining & Metals Corp | Sputtering target consisting of high purity manganese and thin film consisting of high purity manganese which is formed by sputtering |
WO2013105291A1 (en) | 2012-01-10 | 2013-07-18 | Jx日鉱日石金属株式会社 | High-purity manganese and method for producing same |
KR20160018850A (en) | 2012-01-10 | 2016-02-17 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | High-purity manganese and method for producing same |
US9725814B2 (en) | 2012-01-10 | 2017-08-08 | Jx Nippon Mining & Metals Corporation | High purity manganese and method for producing same |
KR20150125721A (en) | 2013-10-25 | 2015-11-09 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | Method for manufacturing high purity manganese and high purity manganese |
KR20150126662A (en) | 2013-10-25 | 2015-11-12 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | Method for manufacturing high purity manganese and high purity manganese |
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