JPS5364479A - Position aligning system - Google Patents

Position aligning system

Info

Publication number
JPS5364479A
JPS5364479A JP14048576A JP14048576A JPS5364479A JP S5364479 A JPS5364479 A JP S5364479A JP 14048576 A JP14048576 A JP 14048576A JP 14048576 A JP14048576 A JP 14048576A JP S5364479 A JPS5364479 A JP S5364479A
Authority
JP
Japan
Prior art keywords
position aligning
aligning system
correction
position alignment
perfrming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14048576A
Other languages
English (en)
Japanese (ja)
Other versions
JPS563660B2 (en:Method
Inventor
Sunao Ishihara
Satoru Nakayama
Toa Hayasaka
Miyao Oda
Kazuo Tamamushi
Hideo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Fujitsu Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Nippon Telegraph and Telephone Corp filed Critical Fujitsu Ltd
Priority to JP14048576A priority Critical patent/JPS5364479A/ja
Publication of JPS5364479A publication Critical patent/JPS5364479A/ja
Publication of JPS563660B2 publication Critical patent/JPS563660B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP14048576A 1976-11-22 1976-11-22 Position aligning system Granted JPS5364479A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14048576A JPS5364479A (en) 1976-11-22 1976-11-22 Position aligning system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14048576A JPS5364479A (en) 1976-11-22 1976-11-22 Position aligning system

Publications (2)

Publication Number Publication Date
JPS5364479A true JPS5364479A (en) 1978-06-08
JPS563660B2 JPS563660B2 (en:Method) 1981-01-26

Family

ID=15269690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14048576A Granted JPS5364479A (en) 1976-11-22 1976-11-22 Position aligning system

Country Status (1)

Country Link
JP (1) JPS5364479A (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04123404U (ja) * 1991-04-23 1992-11-09 安藤電気株式会社 光による移動体の停止機構

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51120180A (en) * 1975-04-15 1976-10-21 Nippon Telegr & Teleph Corp <Ntt> Pattern printing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51120180A (en) * 1975-04-15 1976-10-21 Nippon Telegr & Teleph Corp <Ntt> Pattern printing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04123404U (ja) * 1991-04-23 1992-11-09 安藤電気株式会社 光による移動体の停止機構

Also Published As

Publication number Publication date
JPS563660B2 (en:Method) 1981-01-26

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