JPS535637B1 - - Google Patents

Info

Publication number
JPS535637B1
JPS535637B1 JP4865872A JP4865872A JPS535637B1 JP S535637 B1 JPS535637 B1 JP S535637B1 JP 4865872 A JP4865872 A JP 4865872A JP 4865872 A JP4865872 A JP 4865872A JP S535637 B1 JPS535637 B1 JP S535637B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4865872A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS535637B1 publication Critical patent/JPS535637B1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • H01L21/31116—Etching inorganic layers by chemical means by dry-etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
JP4865872A 1971-05-19 1972-05-18 Pending JPS535637B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14475371A 1971-05-19 1971-05-19

Publications (1)

Publication Number Publication Date
JPS535637B1 true JPS535637B1 (fr) 1978-03-01

Family

ID=22509973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4865872A Pending JPS535637B1 (fr) 1971-05-19 1972-05-18

Country Status (2)

Country Link
JP (1) JPS535637B1 (fr)
DE (1) DE2224468A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63129175A (ja) * 1986-11-19 1988-06-01 Agency Of Ind Science & Technol 水用ピストンポンプ
JPS63126565U (fr) * 1987-02-10 1988-08-18

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3986912A (en) * 1975-09-04 1976-10-19 International Business Machines Corporation Process for controlling the wall inclination of a plasma etched via hole
JPS5852935B2 (ja) * 1978-11-20 1983-11-26 三菱マテリアル株式会社 光伝送用素材の製造方法
DE3343704A1 (de) * 1983-12-02 1985-06-13 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zum aetzen von lochrasterplatten, insbesondere fuer plasma-kathoden-display
DE3642073C1 (en) * 1986-12-10 1988-02-04 Heidenhain Gmbh Dr Johannes Process for etching alkali glass layers by reactive plasma etching
DE102006051550B4 (de) * 2006-10-30 2012-02-02 Fhr Anlagenbau Gmbh Verfahren und Vorrichtung zum Strukturieren von Bauteilen unter Verwendung eines Werkstoffs auf der Basis von Siliziumoxid

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63129175A (ja) * 1986-11-19 1988-06-01 Agency Of Ind Science & Technol 水用ピストンポンプ
JPS63126565U (fr) * 1987-02-10 1988-08-18

Also Published As

Publication number Publication date
DE2224468A1 (de) 1973-01-18

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