JPS5346667B2 - - Google Patents
Info
- Publication number
- JPS5346667B2 JPS5346667B2 JP10303575A JP10303575A JPS5346667B2 JP S5346667 B2 JPS5346667 B2 JP S5346667B2 JP 10303575 A JP10303575 A JP 10303575A JP 10303575 A JP10303575 A JP 10303575A JP S5346667 B2 JPS5346667 B2 JP S5346667B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10303575A JPS5227355A (en) | 1975-08-27 | 1975-08-27 | Diffusion layer formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10303575A JPS5227355A (en) | 1975-08-27 | 1975-08-27 | Diffusion layer formation method |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54111773A Division JPS5835363B2 (en) | 1979-09-03 | 1979-09-03 | Manufacturing method for semiconductor devices |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5227355A JPS5227355A (en) | 1977-03-01 |
JPS5346667B2 true JPS5346667B2 (en) | 1978-12-15 |
Family
ID=14343391
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10303575A Granted JPS5227355A (en) | 1975-08-27 | 1975-08-27 | Diffusion layer formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5227355A (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5470776A (en) * | 1977-11-16 | 1979-06-06 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device and its manufacture |
JPS54154966A (en) * | 1978-05-29 | 1979-12-06 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor electron device |
JPS5578308A (en) * | 1978-12-07 | 1980-06-12 | Nippon Denso Co Ltd | Temperature control method |
JPS56135964A (en) * | 1980-03-28 | 1981-10-23 | Nec Corp | Semiconductor device |
JPS57100794A (en) * | 1980-12-16 | 1982-06-23 | Minoru Hayashi | Radio wave absorbing wall material |
JPS6473800A (en) * | 1987-09-16 | 1989-03-20 | Inax Corp | Electric wave absorbing mortar |
JPS6482600A (en) * | 1987-09-25 | 1989-03-28 | Tokyo Keiki Kk | Radio wave absorbent |
JPH01150398A (en) * | 1987-12-08 | 1989-06-13 | Ohbayashi Corp | Magnetic shielding room |
JP2735914B2 (en) * | 1989-12-29 | 1998-04-02 | 新日本製鐵株式会社 | Radio wave absorber for TV frequency band |
JP2735913B2 (en) * | 1989-12-29 | 1998-04-02 | 新日本製鐵株式会社 | Radio wave absorber for TV frequency band |
JP2591322B2 (en) * | 1990-10-29 | 1997-03-19 | ティーディーケイ株式会社 | Radio wave absorber |
JP2666560B2 (en) * | 1990-10-29 | 1997-10-22 | ティーディーケイ株式会社 | Radio wave absorber |
US8084811B2 (en) * | 2009-10-08 | 2011-12-27 | Monolithic Power Systems, Inc. | Power devices with super junctions and associated methods manufacturing |
-
1975
- 1975-08-27 JP JP10303575A patent/JPS5227355A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5227355A (en) | 1977-03-01 |