JPS534423B2 - - Google Patents

Info

Publication number
JPS534423B2
JPS534423B2 JP13029674A JP13029674A JPS534423B2 JP S534423 B2 JPS534423 B2 JP S534423B2 JP 13029674 A JP13029674 A JP 13029674A JP 13029674 A JP13029674 A JP 13029674A JP S534423 B2 JPS534423 B2 JP S534423B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13029674A
Other languages
Japanese (ja)
Other versions
JPS5156226A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13029674A priority Critical patent/JPS5156226A/ja
Publication of JPS5156226A publication Critical patent/JPS5156226A/ja
Publication of JPS534423B2 publication Critical patent/JPS534423B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP13029674A 1974-11-11 1974-11-11 Hojitaipukankoseijushino genzozai Granted JPS5156226A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13029674A JPS5156226A (ja) 1974-11-11 1974-11-11 Hojitaipukankoseijushino genzozai

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13029674A JPS5156226A (ja) 1974-11-11 1974-11-11 Hojitaipukankoseijushino genzozai

Publications (2)

Publication Number Publication Date
JPS5156226A JPS5156226A (ja) 1976-05-17
JPS534423B2 true JPS534423B2 (enrdf_load_stackoverflow) 1978-02-17

Family

ID=15030911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13029674A Granted JPS5156226A (ja) 1974-11-11 1974-11-11 Hojitaipukankoseijushino genzozai

Country Status (1)

Country Link
JP (1) JPS5156226A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0101010A1 (de) * 1982-08-13 1984-02-22 Hoechst Aktiengesellschaft Wässrig-alkalische Lösing und Verfahren zum Entwickeln von positiv-arbeitenden Schichten

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141733A (en) * 1977-10-25 1979-02-27 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
CA1120763A (en) * 1977-11-23 1982-03-30 James A. Carothers Enhancement of resist development
US4294911A (en) * 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer
JPS59219743A (ja) * 1983-05-28 1984-12-11 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
US4606999A (en) * 1983-12-21 1986-08-19 Thiokol Corporation Development of positive photoresists using cyclic quaternary ammonium hydroxides
US4711836A (en) * 1984-09-10 1987-12-08 Olin Hunt Specialty Products, Inc. Development of positive-working photoresist compositions

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM TECHNICAL DISCLOSURE BULLETIN=1970 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0101010A1 (de) * 1982-08-13 1984-02-22 Hoechst Aktiengesellschaft Wässrig-alkalische Lösing und Verfahren zum Entwickeln von positiv-arbeitenden Schichten

Also Published As

Publication number Publication date
JPS5156226A (ja) 1976-05-17

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