JPS5156226A - Hojitaipukankoseijushino genzozai - Google Patents

Hojitaipukankoseijushino genzozai

Info

Publication number
JPS5156226A
JPS5156226A JP13029674A JP13029674A JPS5156226A JP S5156226 A JPS5156226 A JP S5156226A JP 13029674 A JP13029674 A JP 13029674A JP 13029674 A JP13029674 A JP 13029674A JP S5156226 A JPS5156226 A JP S5156226A
Authority
JP
Japan
Prior art keywords
hojitaipukankoseijushino
genzozai
hojitaipukankoseijushino genzozai
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13029674A
Other languages
English (en)
Japanese (ja)
Other versions
JPS534423B2 (enrdf_load_stackoverflow
Inventor
Hideo Matsuzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanei Kagaku Kogyo KK
Original Assignee
Sanei Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanei Kagaku Kogyo KK filed Critical Sanei Kagaku Kogyo KK
Priority to JP13029674A priority Critical patent/JPS5156226A/ja
Publication of JPS5156226A publication Critical patent/JPS5156226A/ja
Publication of JPS534423B2 publication Critical patent/JPS534423B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP13029674A 1974-11-11 1974-11-11 Hojitaipukankoseijushino genzozai Granted JPS5156226A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13029674A JPS5156226A (ja) 1974-11-11 1974-11-11 Hojitaipukankoseijushino genzozai

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13029674A JPS5156226A (ja) 1974-11-11 1974-11-11 Hojitaipukankoseijushino genzozai

Publications (2)

Publication Number Publication Date
JPS5156226A true JPS5156226A (ja) 1976-05-17
JPS534423B2 JPS534423B2 (enrdf_load_stackoverflow) 1978-02-17

Family

ID=15030911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13029674A Granted JPS5156226A (ja) 1974-11-11 1974-11-11 Hojitaipukankoseijushino genzozai

Country Status (1)

Country Link
JP (1) JPS5156226A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141733A (en) * 1977-10-25 1979-02-27 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
EP0002105A1 (en) * 1977-11-23 1979-05-30 International Business Machines Corporation Process for increasing the solubility rate ratio of a positive-working resist
US4294911A (en) * 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer
US4606999A (en) * 1983-12-21 1986-08-19 Thiokol Corporation Development of positive photoresists using cyclic quaternary ammonium hydroxides
US4610953A (en) * 1983-05-28 1986-09-09 Tokyo Ohka Kogyo Co., Ltd. Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide
US4711836A (en) * 1984-09-10 1987-12-08 Olin Hunt Specialty Products, Inc. Development of positive-working photoresist compositions

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3230171A1 (de) * 1982-08-13 1984-02-16 Hoechst Ag, 6230 Frankfurt Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM TECHNICAL DISCLOSURE BULLETIN=1970 *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141733A (en) * 1977-10-25 1979-02-27 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
FR2407497A1 (fr) * 1977-10-25 1979-05-25 Eastman Kodak Co Procede pour former une reserve photographique, utile en particulier dans les arts graphiques et en microelectronique
JPS5474432A (en) * 1977-10-25 1979-06-14 Eastman Kodak Co Method of developing photosensitive quinone diazide composition
EP0002105A1 (en) * 1977-11-23 1979-05-30 International Business Machines Corporation Process for increasing the solubility rate ratio of a positive-working resist
US4294911A (en) * 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer
US4610953A (en) * 1983-05-28 1986-09-09 Tokyo Ohka Kogyo Co., Ltd. Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide
US4606999A (en) * 1983-12-21 1986-08-19 Thiokol Corporation Development of positive photoresists using cyclic quaternary ammonium hydroxides
US4711836A (en) * 1984-09-10 1987-12-08 Olin Hunt Specialty Products, Inc. Development of positive-working photoresist compositions

Also Published As

Publication number Publication date
JPS534423B2 (enrdf_load_stackoverflow) 1978-02-17

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