JPS5156226A - Hojitaipukankoseijushino genzozai - Google Patents
Hojitaipukankoseijushino genzozaiInfo
- Publication number
- JPS5156226A JPS5156226A JP13029674A JP13029674A JPS5156226A JP S5156226 A JPS5156226 A JP S5156226A JP 13029674 A JP13029674 A JP 13029674A JP 13029674 A JP13029674 A JP 13029674A JP S5156226 A JPS5156226 A JP S5156226A
- Authority
- JP
- Japan
- Prior art keywords
- hojitaipukankoseijushino
- genzozai
- hojitaipukankoseijushino genzozai
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13029674A JPS5156226A (ja) | 1974-11-11 | 1974-11-11 | Hojitaipukankoseijushino genzozai |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13029674A JPS5156226A (ja) | 1974-11-11 | 1974-11-11 | Hojitaipukankoseijushino genzozai |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5156226A true JPS5156226A (ja) | 1976-05-17 |
JPS534423B2 JPS534423B2 (enrdf_load_stackoverflow) | 1978-02-17 |
Family
ID=15030911
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13029674A Granted JPS5156226A (ja) | 1974-11-11 | 1974-11-11 | Hojitaipukankoseijushino genzozai |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5156226A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4141733A (en) * | 1977-10-25 | 1979-02-27 | Eastman Kodak Company | Development of light-sensitive quinone diazide compositions |
EP0002105A1 (en) * | 1977-11-23 | 1979-05-30 | International Business Machines Corporation | Process for increasing the solubility rate ratio of a positive-working resist |
US4294911A (en) * | 1979-06-18 | 1981-10-13 | Eastman Kodak Company | Development of light-sensitive quinone diazide compositions using sulfite stabilizer |
US4606999A (en) * | 1983-12-21 | 1986-08-19 | Thiokol Corporation | Development of positive photoresists using cyclic quaternary ammonium hydroxides |
US4610953A (en) * | 1983-05-28 | 1986-09-09 | Tokyo Ohka Kogyo Co., Ltd. | Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide |
US4711836A (en) * | 1984-09-10 | 1987-12-08 | Olin Hunt Specialty Products, Inc. | Development of positive-working photoresist compositions |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3230171A1 (de) * | 1982-08-13 | 1984-02-16 | Hoechst Ag, 6230 Frankfurt | Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten |
-
1974
- 1974-11-11 JP JP13029674A patent/JPS5156226A/ja active Granted
Non-Patent Citations (1)
Title |
---|
IBM TECHNICAL DISCLOSURE BULLETIN=1970 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4141733A (en) * | 1977-10-25 | 1979-02-27 | Eastman Kodak Company | Development of light-sensitive quinone diazide compositions |
FR2407497A1 (fr) * | 1977-10-25 | 1979-05-25 | Eastman Kodak Co | Procede pour former une reserve photographique, utile en particulier dans les arts graphiques et en microelectronique |
JPS5474432A (en) * | 1977-10-25 | 1979-06-14 | Eastman Kodak Co | Method of developing photosensitive quinone diazide composition |
EP0002105A1 (en) * | 1977-11-23 | 1979-05-30 | International Business Machines Corporation | Process for increasing the solubility rate ratio of a positive-working resist |
US4294911A (en) * | 1979-06-18 | 1981-10-13 | Eastman Kodak Company | Development of light-sensitive quinone diazide compositions using sulfite stabilizer |
US4610953A (en) * | 1983-05-28 | 1986-09-09 | Tokyo Ohka Kogyo Co., Ltd. | Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide |
US4606999A (en) * | 1983-12-21 | 1986-08-19 | Thiokol Corporation | Development of positive photoresists using cyclic quaternary ammonium hydroxides |
US4711836A (en) * | 1984-09-10 | 1987-12-08 | Olin Hunt Specialty Products, Inc. | Development of positive-working photoresist compositions |
Also Published As
Publication number | Publication date |
---|---|
JPS534423B2 (enrdf_load_stackoverflow) | 1978-02-17 |
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